Inventor
KELLY JAMES J
US42 patents
⚠️ This page may combine multiple inventors who share the name “KELLY JAMES J”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IBM
34 patentsUS10529622B1Jan 7, 2020
Void-free metallic interconnect structures with self-formed diffusion barrier layers
IBM16 citations94
US10395986B1Aug 27, 2019
Fully aligned via employing selective metal deposition
IBM24 citations94
US10361119B1Jul 23, 2019
Enlarged contact area structure using noble metal cap and noble metal liner
IBM10 citations84
US8853095B1Oct 7, 2014
Hybrid hard mask for damascene and dual damascene
IBM8 citations84
US9780035B1Oct 3, 2017
Structure and method for improved stabilization of cobalt cap and/or cobalt liner in interconnects
IBM10 citations83
US10943883B1Mar 9, 2021
Planar wafer level fan-out of multi-chip modules having different size chips
IBM6 citations73
US10910307B2Feb 2, 2021
Back end of line metallization structure
IBM3 citations73
US10903161B2Jan 26, 2021
Back end of line metallization structure
IBM3 citations73
US10825726B2Nov 3, 2020
Metal spacer self aligned multi-patterning integration
IBM2 citations73
US10615027B1Apr 7, 2020
Stack viabar structures
IBM2 citations73
US9793213B2Oct 17, 2017
Ion flow barrier structure for interconnect metallization
IBM2 citations73
US9716065B2Jul 25, 2017
Via bottom structure and methods of forming
IBM2 citations73
US8698318B2Apr 15, 2014
Superfilled metal contact vias for semiconductor devices
IBM4 citations72
US11152298B2Oct 19, 2021
Metal via structure
IBM3 citations71
US10971356B2Apr 6, 2021
Stack viabar structures
IBM0 citations63
US12438046B2Oct 7, 2025
Dual redistribution layer structure
IBM0 citations62
US11848273B2Dec 19, 2023
Bridge chip with through via
IBM0 citations62
US11682640B2Jun 20, 2023
Protective surface layer on under bump metallurgy for solder joining
IBM0 citations62
US11315831B2Apr 26, 2022
Dual redistribution layer structure
IBM1 citations62
US11251126B2Feb 15, 2022
Replacement metal cap by an exchange reaction
IBM0 citations62
US11239167B2Feb 1, 2022
Cu—Cu bonding for interconnects on bridge chip attached to chips and packaging substrate
IBM0 citations62
US11171006B2Nov 9, 2021
Simultaneous plating of varying size features on semiconductor substrate
IBM0 citations62
US10903116B2Jan 26, 2021
Void-free metallic interconnect structures with self-formed diffusion barrier layers
IBM0 citations62
US11784120B2Oct 10, 2023
Metal via structure
IBM0 citations61
US9184042B1Nov 10, 2015
Wafer backside particle mitigation
IBM2 citations61
US7501345B1Mar 10, 2009
Selective silicide formation by electrodeposit displacement reaction
IBM5 citations61
US12469787B2Nov 11, 2025
Resist patterned redistribution wiring on copper polyimide via layer
IBM0 citations60
US11133457B2Sep 28, 2021
Controllable formation of recessed bottom electrode contact in a memory metallization stack
IBM1 citations60
US11063126B2Jul 13, 2021
Metal contact isolation for semiconductor structures
IBM0 citations52
US10651125B2May 12, 2020
Replacement metal cap by an exchange reaction
IBM0 citations52
US9966305B2May 8, 2018
Ion flow barrier structure for interconnect metallization
IBM0 citations52
US10134674B2Nov 20, 2018
Structure and method for improved stabilization of cobalt cap and/or cobalt liner in interconnects
IBM0 citations51
US9318347B2Apr 19, 2016
Wafer backside particle mitigation
IBM0 citations51
US11264306B2Mar 1, 2022
Hybrid TIMs for electronic package cooling
IBM0 citations49