P

Inventor

KELLY JAMES J

US42 patents
⚠️ This page may combine multiple inventors who share the name “KELLY JAMES J”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

IBM

34 patents
US10529622B1Jan 7, 2020

Void-free metallic interconnect structures with self-formed diffusion barrier layers

IBM16 citations94
US10395986B1Aug 27, 2019

Fully aligned via employing selective metal deposition

IBM24 citations94
US10361119B1Jul 23, 2019

Enlarged contact area structure using noble metal cap and noble metal liner

IBM10 citations84
US8853095B1Oct 7, 2014

Hybrid hard mask for damascene and dual damascene

IBM8 citations84
US9780035B1Oct 3, 2017

Structure and method for improved stabilization of cobalt cap and/or cobalt liner in interconnects

IBM10 citations83
US10943883B1Mar 9, 2021

Planar wafer level fan-out of multi-chip modules having different size chips

IBM6 citations73
US10910307B2Feb 2, 2021

Back end of line metallization structure

IBM3 citations73
US10903161B2Jan 26, 2021

Back end of line metallization structure

IBM3 citations73
US10825726B2Nov 3, 2020

Metal spacer self aligned multi-patterning integration

IBM2 citations73
US10615027B1Apr 7, 2020

Stack viabar structures

IBM2 citations73
US9793213B2Oct 17, 2017

Ion flow barrier structure for interconnect metallization

IBM2 citations73
US9716065B2Jul 25, 2017

Via bottom structure and methods of forming

IBM2 citations73
US8698318B2Apr 15, 2014

Superfilled metal contact vias for semiconductor devices

IBM4 citations72
US11152298B2Oct 19, 2021

Metal via structure

IBM3 citations71
US10971356B2Apr 6, 2021

Stack viabar structures

IBM0 citations63
US12438046B2Oct 7, 2025

Dual redistribution layer structure

IBM0 citations62
US11848273B2Dec 19, 2023

Bridge chip with through via

IBM0 citations62
US11682640B2Jun 20, 2023

Protective surface layer on under bump metallurgy for solder joining

IBM0 citations62
US11315831B2Apr 26, 2022

Dual redistribution layer structure

IBM1 citations62
US11251126B2Feb 15, 2022

Replacement metal cap by an exchange reaction

IBM0 citations62
US11239167B2Feb 1, 2022

Cu—Cu bonding for interconnects on bridge chip attached to chips and packaging substrate

IBM0 citations62
US11171006B2Nov 9, 2021

Simultaneous plating of varying size features on semiconductor substrate

IBM0 citations62
US10903116B2Jan 26, 2021

Void-free metallic interconnect structures with self-formed diffusion barrier layers

IBM0 citations62
US11784120B2Oct 10, 2023

Metal via structure

IBM0 citations61
US9184042B1Nov 10, 2015

Wafer backside particle mitigation

IBM2 citations61
US7501345B1Mar 10, 2009

Selective silicide formation by electrodeposit displacement reaction

IBM5 citations61
US12469787B2Nov 11, 2025

Resist patterned redistribution wiring on copper polyimide via layer

IBM0 citations60
US11133457B2Sep 28, 2021

Controllable formation of recessed bottom electrode contact in a memory metallization stack

IBM1 citations60
US11063126B2Jul 13, 2021

Metal contact isolation for semiconductor structures

IBM0 citations52
US10651125B2May 12, 2020

Replacement metal cap by an exchange reaction

IBM0 citations52
US9966305B2May 8, 2018

Ion flow barrier structure for interconnect metallization

IBM0 citations52
US10134674B2Nov 20, 2018

Structure and method for improved stabilization of cobalt cap and/or cobalt liner in interconnects

IBM0 citations51
US9318347B2Apr 19, 2016

Wafer backside particle mitigation

IBM0 citations51
US11264306B2Mar 1, 2022

Hybrid TIMs for electronic package cooling

IBM0 citations49

KELLY JAMES J

3 patents

US ENERGY

1 patent

WOMCO INC

1 patent

SANDIA NAT LAB

1 patent

FONAR INC

1 patent

AMERICAN CYANAMID CO

1 patent