Inventor
FUJIMORI MASAAKI
JP15 patents
⚠️ This page may combine multiple inventors who share the name “FUJIMORI MASAAKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI LTD
10 patentsUS7868323B2Jan 11, 2011
Thin film transistor device, image display device and manufacturing method thereof
HITACHI LTD9 citations84
US7772622B2Aug 10, 2010
Field effect transistor and manufacturing method thereof
HITACHI LTD13 citations84
US7608857B2Oct 27, 2009
Field effect transistor having a structure in which an organic semiconductor that forms a channel is made of a single crystal or a polycrystal of organic molecules
HITACHI LTD8 citations84
US8013327B2Sep 6, 2011
Electronic device
HITACHI LTD2 citations63
US7872254B2Jan 18, 2011
Wiring and organic transistor, and manufacturing method thereof
HITACHI LTD5 citations62
US7807496B2Oct 5, 2010
Field effect transistor and its manufacturing method
HITACHI LTD6 citations62
US6780698B2Aug 24, 2004
Semiconductor device and its production method
HITACHI LTD2 citations62
US7872257B2Jan 18, 2011
Organic thin film transistor array and method of manufacturing the same
HITACHI LTD1 citations52
US9535135B2Jan 3, 2017
Method for calculating solar radiation amount and method for determining power to be supplied
HITACHI LTD1 citations51
US9711663B2Jul 18, 2017
Power generating system and method of designing power generating system
HITACHI LTD0 citations48
SEIKO EPSON CORP
3 patentsUS11425793B2Aug 23, 2022
Printing apparatus
SEIKO EPSON CORP0 citations62
US11198307B2Dec 14, 2021
Printing apparatus having a heater that includes a protection section for a heat generating resistor
SEIKO EPSON CORP0 citations62
US11207902B2Dec 28, 2021
Printing apparatus having multiple heaters with overlapping heat zones
SEIKO EPSON CORP0 citations51
RENESAS TECH CORP
2 patentsUS6774041B1Aug 10, 2004
Polishing method, metallization fabrication method, method for manufacturing semiconductor device and semiconductor device
RENESAS TECH CORP52 citations96
US7183212B2Feb 27, 2007
Polishing method, metallization fabrication method, method for manufacturing semiconductor device and semiconductor device
RENESAS TECH CORP3 citations63