Inventor

MAZOR ISAAC

IL41 patents

⚠️ This page may combine multiple inventors who share the name “MAZOR ISAAC”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

MAZOR ISAAC

JORDAN VALLEY APPLIED RADIATION LTD

Combined X-ray reflectometer and diffractometer

Measurement of critical dimensions using X-rays

X-ray microanalyzer for thin films

X-ray microfluorescence analyzer

X-ray reflectometer

Measurement of critical dimensions using X-ray diffraction in reflection mode

Dual-wavelength X-ray reflectometry

X-ray reflectometer

X-ray array detector

Beam centering and angle calibration for X-ray reflectometry

Enhancing resolution of X-ray measurements by sample motion

Enhancement of X-ray reflectometry by measurement of diffuse reflections

Optical alignment of X-ray microanalyzers

Differential measurement of X-ray microfluorescence

Detection of voids in semiconductor wafer processing

Overlay metrology using X-rays

Detection of dishing and tilting using X-ray fluorescence

Efficient measurement of diffuse X-ray reflections

Dual-wavelength x-ray monochromator

Contamination and residuals inspection system

JORDAN VALLEY SEMICONDUCTORS

Multifunction X-ray analysis system

Measurement of properties of thin films on sidewalls

Inspection of small features using X-ray fluorescence

Control of X-ray beam spot size

Automated selection of X-ray reflectometry measurement locations

Estimation of XRF intensity from an array of micro-bumps

Accurate measurement of layer dimensions using XRF

X-ray inspection of bumps on a semiconductor substrate

JORDAN VALLEY SEMICONDUCTORS LTD

Angle calibration for grazing-incidence X-ray fluorescence (GIXRF)

Measurement of small features using XRF

X-ray scatterometry apparatus

Method for accurately determining the thickness and/or elemental composition of small features on thin-substrates using micro-XRF

X-ray source assembly

KLA INSTR CORP

Method of image enhancement for the coherence probe microscope with applications to integrated circuit metrology

Process for measuring overlay misregistration during semiconductor wafer fabrication

YOKHIN BORIS

High-resolution X-ray diffraction measurement with enhanced sensitivity

High-resolution X-ray diffraction measurement with enhanced sensitivity

JORDON VALLEY APPLIED RADIATIO

XRR detector readout processing

SELA SEMICONDUCTOR ENG LABORATORIES

Method and apparatus for cleaving semiconductor wafers

BRUKER JV ISRAEL LTD

Closed-loop control of X-ray knife edge

MAZOR ISAAC

Combining X-ray and VUV analysis of thin film layers