Inventor
DOI YASUNORI
JP26 patents
⚠️ This page may combine multiple inventors who share the name “DOI YASUNORI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI LTD
13 patentsUS6538254B1Mar 25, 2003
Method and apparatus for sample fabrication
HITACHI LTD315 citations99
US7071475B2Jul 4, 2006
Method and apparatus for specimen fabrication
HITACHI LTD61 citations97
US6828566B2Dec 7, 2004
Method and apparatus for specimen fabrication
HITACHI LTD62 citations97
US7138628B2Nov 21, 2006
Method and apparatus for specimen fabrication
HITACHI LTD35 citations96
US7525108B2Apr 28, 2009
Focused ion beam apparatus for specimen fabrication
HITACHI LTD16 citations93
US7397050B2Jul 8, 2008
Method and apparatus for specimen fabrication
HITACHI LTD16 citations93
US7397052B2Jul 8, 2008
Method and apparatus for specimen fabrication
HITACHI LTD16 citations93
US7176458B2Feb 13, 2007
Method and apparatus for specimen fabrication
HITACHI LTD18 citations93
US7397051B2Jul 8, 2008
Method and apparatus for specimen fabrication
HITACHI LTD8 citations82
US7999240B2Aug 16, 2011
Method and apparatus for specimen fabrication
HITACHI LTD4 citations74
US7791050B2Sep 7, 2010
Method and apparatus for specimen fabrication
HITACHI LTD4 citations74
US9696288B2Jul 4, 2017
Attached matter testing device and testing method
HITACHI LTD3 citations73
US9214324B2Dec 15, 2015
Analysis device and analysis method
HITACHI LTD3 citations62
SUMITOMO CHEMICAL CO
9 patentsUS5283155AFeb 1, 1994
Positive resist composition comprising an alkali-soluble resin and a quinone diazide sulfonic acid ester of a hydroxy flavan derivative
SUMITOMO CHEMICAL CO11 citations74
US5792585AAug 11, 1998
Radiation-sensitive positive resist composition
SUMITOMO CHEMICAL CO7 citations73
US5736292AApr 7, 1998
Radiation-sensitive positive resist composition comprising an alkali soluble resin made from m-cresol, 2,3,5-trimethyl phenol and optionally p-cresol and a polyphenol compound having alkyl or alkoxy side groups
SUMITOMO CHEMICAL CO9 citations73
US5407780AApr 18, 1995
Radiation-sensitive positive resist composition comprising an alkali-soluble resin made from m-cresol, 2-tert-butl-5-methyl phenol and formaldehyde
SUMITOMO CHEMICAL CO8 citations72
US5403696AApr 4, 1995
Radiation-sensitive positive resist composition comprising an alkali-soluble resin made from tert-butyl-methyl phenol
SUMITOMO CHEMICAL CO7 citations71
US5783355AJul 21, 1998
Radiation-sensitive positive resist composition
SUMITOMO CHEMICAL CO1 citations62
US5336583AAug 9, 1994
Positive quinonediazide resist composition utilizing mixed solvent of ethyl lactate and 2-heptanone
SUMITOMO CHEMICAL CO5 citations62
US5283324AFeb 1, 1994
Process for preparing radiation sensitive compound and positive resist composition
SUMITOMO CHEMICAL CO6 citations62
US6383708B1May 7, 2002
Positive resist composition
SUMITOMO CHEMICAL CO1 citations52