Inventor

SHIEH MING-FENG

TW117 patents

⚠️ This page may combine multiple inventors who share the name “SHIEH MING-FENG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SHIEH MING-FENG

TAIWAN SEMICONDUCTOR MFG

Spacer etching process for integrated circuit design

Integrated circuit layout design

Method of making a FinFET device

Method of pitch halving

Integrated circuit layout design

Lithography using high selectivity spacers for pitch reduction

Method of semiconductor integrated circuit fabrication

Method of making a FinFET device

Method of fabricating a FinFET device

Self-alignment for using two or more layers and methods of forming same

Method for integrated circuit patterning

Method of forming a fin-like BJT

Systems and methods for a sequential spacer scheme

Mechanisms for forming patterns using multiple lithography processes

Method for integrated circuit patterning

Method of patterning a feature of a semiconductor device

Method of fabricating a FinFET device

High gate density devices and methods

Structure and method for fabricating fin devices

Photo resist trimmed line end space

Method and device for increasing fin device density for unaligned fins

Method for patterning a plurality of features for Fin-like field-effect transistor (FinFET) devices

Method of patterning features of a semiconductor device

TAIWAN SEMICONDUCTOR MFG CO LTD

Method of spacer patterning to form a target integrated circuit pattern

Lithography using high selectivity spacers for pitch reduction

Lithography using high selectivity spacers for pitch reduction

Layer alignment in FinFET fabrication

Method of making a FinFET device

Method of making a FinFET device

Structure and method for providing line end extensions for fin-type active regions

Overlay mark

Mechanisms for forming patterns using multiple lithography processes

Method of semiconductor integrated circuit fabrication

Structure and method for providing line end extensions for fin-type active regions

Mechanisms for forming patterns using multiple lithography processes

Overlay mark

SHIEH MING-FENG

Cross OD FinFET patterning

Mandrel modification for achieving single fin fin-like field effect transistor (FinFET) device

High gate density devices and methods

Cross OD FinFET patterning

Method of fabrication of a semiconductor device having reduced pitch

WANN CLEMENT HSINGJEN

System and methods for converting planar design to FinFET design

System and methods for converting planar design to FinFET design

DE HO WEI

Cut-mask patterning process for fin-like field effect transistor (FinFET) device

Patterning process for fin-like field effect transistor (finFET) device

WANG CHIEN-HSUN

Device and method for forming Fins in integrated circuitry

Method for forming metrology structures from fins in integrated circuitry

YU SHAO-MING

Structure and method for transistor with line end extension

CHANG CHIH-SHENG

Fin-like BJT

CHEN CHEN-YU

Overlay mark and method of measuring the same