Inventor

DE HO WEI

TW2 patents

Patents

2 patents

US9236267B2Jan 12, 2016

Cut-mask patterning process for fin-like field effect transistor (FinFET) device

DE HO WEI3,095 citations97

US8741776B2Jun 3, 2014

Patterning process for fin-like field effect transistor (finFET) device

DE HO WEI35 citations92