Inventor

LU KUEI-LIANG

TW23 patents

⚠️ This page may combine multiple inventors who share the name “LU KUEI-LIANG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

LU KUEI-LIANG

TAIWAN SEMICONDUCTOR MFG CO LTD

Layout optimization of a main pattern and a cut pattern

Layer alignment in FinFET fabrication

Structure and method for providing line end extensions for fin-type active regions

Structure and method for providing line end extensions for fin-type active regions

Structure and method for transistors with line end extension

Structure and method for providing line end extensions for fin-type active regions

Method for patterning a plurality of features for fin-like field-effect transistor (FinFET) devices

Lithography alignment marks

Method of lithography process with inserting scattering bars

Layout optimization of a main pattern and a cut pattern

Layout optimization of a main pattern and a cut pattern

Method of using a vaporizing spray system to perform a trimming process

Photomask and method for fabricating integrated circuit

Cut-mask patterning process for FIN-like field effect transistor (FINFET) device

Photomask and method for fabricating integrated circuit

TAIWAN SEMICONDUCTOR MFG

Method for patterning a plurality of features for Fin-like field-effect transistor (FinFET) devices

Polygon-based optical proximity correction

DE HO WEI

Cut-mask patterning process for fin-like field effect transistor (FinFET) device

YU SHAO-MING

Structure and method for transistor with line end extension

MOSAID TECH INCORPORATED

Structure and method for providing line end extensions for fin-type active regions

MOSAID TECHNOLOGIES INC

Structure and method for providing line end extensions for fin-type active regions

SHIEH MING-FENG

Layer alignment in FinFET fabrication

LU KUEI-LIANG

Method of fabricating a semiconductor device