Inventor
EISENMENGER JOHANNES
DE16 patents
⚠️ This page may combine multiple inventors who share the name “EISENMENGER JOHANNES”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ZEISS CARL SMT GMBH
14 patentsUS10444631B2Oct 15, 2019
Method of operating a microlithographic projection apparatus and illumination system of such an apparatus
ZEISS CARL SMT GMBH2 citations72
US9910360B2Mar 6, 2018
Lighting system of a microlithographic projection exposure system and method for operating such a lighting system
ZEISS CARL SMT GMBH2 citations72
US9915872B2Mar 13, 2018
Optical component
ZEISS CARL SMT GMBH2 citations71
US9874819B2Jan 23, 2018
Mirror array
ZEISS CARL SMT GMBH4 citations70
US9897925B2Feb 20, 2018
Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH1 citations62
US9239229B2Jan 19, 2016
Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH1 citations62
US9563129B2Feb 7, 2017
Monitor system for determining orientations of mirror elements and EUV lithography system
ZEISS CARL SMT GMBH1 citations52
US9019475B2Apr 28, 2015
Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH0 citations52
US9001309B2Apr 7, 2015
Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH0 citations52
US10274828B2Apr 30, 2019
Lighting system of a microlithographic projection exposure system and method for operating such a lighting system
ZEISS CARL SMT GMBH0 citations51
US9535331B2Jan 3, 2017
Optical system for a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH0 citations51
US10018803B2Jul 10, 2018
Device and method for controlling positioning of multiple adjustable mirror elements in a multi-mirror arrangement
ZEISS CARL SMT GMBH0 citations47
US9977334B2May 22, 2018
Lighting system of a microlithographic projection exposure system and method for operating such a lighting system
ZEISS CARL SMT GMBH0 citations41
US10409167B2Sep 10, 2019
Method for illuminating an object field of a projection exposure system
ZEISS CARL SMT GMBH0 citations39
XALTER STEFAN
2 patentsUS9013684B2Apr 21, 2015
Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
XALTER STEFAN17 citations91
US8339577B2Dec 25, 2012
Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
XALTER STEFAN9 citations82