Inventor
FUJINO YUTAKA
JP22 patents
⚠️ This page may combine multiple inventors who share the name “FUJINO YUTAKA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
18 patentsUS7674722B2Mar 9, 2010
Method of forming gate insulating film, semiconductor device and computer recording medium
TOKYO ELECTRON LTD11 citations83
US9663856B2May 30, 2017
Plasma processing apparatus and shower plate
TOKYO ELECTRON LTD5 citations73
US9520272B2Dec 13, 2016
Microwave emission mechanism, microwave plasma source and surface wave plasma processing apparatus
TOKYO ELECTRON LTD3 citations73
US10170347B2Jan 1, 2019
Substrate processing system
TOKYO ELECTRON LTD3 citations72
US9702913B2Jul 11, 2017
Acquisition method for S-parameters in microwave introduction modules, and malfunction detection method
TOKYO ELECTRON LTD2 citations72
US12112921B2Oct 8, 2024
Plasma processing method and plasma processing apparatus
TOKYO ELECTRON LTD0 citations62
US12060641B2Aug 13, 2024
Film forming method and film forming apparatus
TOKYO ELECTRON LTD0 citations60
US10557200B2Feb 11, 2020
Plasma processing device with shower plate having protrusion for suppressing film formation in gas holes of shower plate
TOKYO ELECTRON LTD1 citations58
US10879069B2Dec 29, 2020
Method and apparatus for forming hard mask film and method for manufacturing semiconductor devices
TOKYO ELECTRON LTD0 citations51
US9548187B2Jan 17, 2017
Microwave radiation antenna, microwave plasma source and plasma processing apparatus
TOKYO ELECTRON LTD1 citations51
US12129544B2Oct 29, 2024
Cleaning method and plasma treatment device
TOKYO ELECTRON LTD0 citations50
US12077865B2Sep 3, 2024
Film forming method and film forming apparatus
TOKYO ELECTRON LTD0 citations50
US9991097B2Jun 5, 2018
Plasma processing apparatus
TOKYO ELECTRON LTD0 citations50
US10153169B2Dec 11, 2018
Method of controlling threshold of transistor and method of manufacturing semiconductor device
TOKYO ELECTRON LTD0 citations48
US9640388B2May 2, 2017
Method for forming insulating film and method for manufacturing semiconductor device
TOKYO ELECTRON LTD0 citations46
US10211032B2Feb 19, 2019
Microwave plasma source and plasma processing apparatus
TOKYO ELECTRON LTD0 citations41
US9887081B2Feb 6, 2018
Method for manufacturing insulating film laminated structure
TOKYO ELECTRON LTD0 citations37
US10804078B2Oct 13, 2020
Plasma processing apparatus and gas introduction mechanism
TOKYO ELECTRON LTD0 citations36