Inventor
TANIGUCHI RYOSUKE
JP39 patents
⚠️ This page may combine multiple inventors who share the name “TANIGUCHI RYOSUKE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SHINETSU CHEMICAL CO
21 patentsUS10248022B2Apr 2, 2019
Sulfonium compound, making method, resist composition, and pattern forming process
SHINETSU CHEMICAL CO8 citations84
US10180626B2Jan 15, 2019
Sulfonium salt, resist composition, and patterning process
SHINETSU CHEMICAL CO9 citations84
US10173975B2Jan 8, 2019
Sulfonium compound, resist composition, and pattern forming process
SHINETSU CHEMICAL CO8 citations84
US9221742B2Dec 29, 2015
Sulfonium salt, chemically amplified resist composition, and pattern forming process
SHINETSU CHEMICAL CO7 citations84
US9740100B2Aug 22, 2017
Hemiacetal compound, polymer, resist composition, and patterning process
SHINETSU CHEMICAL CO2 citations73
US9703193B2Jul 11, 2017
Onium salt, resist composition, and patterning process
SHINETSU CHEMICAL CO2 citations73
US11614688B2Mar 28, 2023
Resist composition and patterning process
SHINETSU CHEMICAL CO1 citations63
US9256127B2Feb 9, 2016
Monomer, polymer, resist composition, and patterning process
SHINETSU CHEMICAL CO2 citations63
US7727704B2Jun 1, 2010
Positive resist compositions and patterning process
SHINETSU CHEMICAL CO3 citations63
US7691561B2Apr 6, 2010
Positive resist compositions and patterning process
SHINETSU CHEMICAL CO3 citations63
US12174536B2Dec 24, 2024
Resist composition and pattern forming process
SHINETSU CHEMICAL CO0 citations62
US11492337B2Nov 8, 2022
Epoxy compound, resist composition, and pattern forming process
SHINETSU CHEMICAL CO0 citations62
US12060317B2Aug 13, 2024
Onium salt, chemically amplified negative resist composition, and pattern forming process
SHINETSU CHEMICAL CO0 citations52
US11773059B2Oct 3, 2023
Onium salt, chemically amplified negative resist composition, and pattern forming process
SHINETSU CHEMICAL CO0 citations52
US11579526B2Feb 14, 2023
Resist composition and patterning process
SHINETSU CHEMICAL CO0 citations52
US10921710B2Feb 16, 2021
Resist composition and pattern forming process
SHINETSU CHEMICAL CO0 citations52
US9458144B2Oct 4, 2016
Monomer, polymer, resist composition, and patterning process
SHINETSU CHEMICAL CO1 citations52
US9223205B2Dec 29, 2015
Acid generator, chemically amplified resist composition, and patterning process
SHINETSU CHEMICAL CO1 citations52
US11215926B2Jan 4, 2022
Sulfonium compound, resist composition, and patterning process
SHINETSU CHEMICAL CO0 citations51
US10025180B2Jul 17, 2018
Sulfonium compound, resist composition, and patterning process
SHINETSU CHEMICAL CO1 citations51
US10310376B2Jun 4, 2019
Resist composition, pattern forming process, polymer, and monomer
SHINETSU CHEMICAL CO0 citations42
MITSUBISHI CHEM CORP
5 patentsUS11674073B2Jun 13, 2023
Diverting agent and method of filling fracture in well using same
MITSUBISHI CHEM CORP2 citations72
US12410363B2Sep 9, 2025
Diverting agent and method of filling fracture in well using same
MITSUBISHI CHEM CORP0 citations62
US11891569B2Feb 6, 2024
Diverting agent and method of filling fracture in well using the same
MITSUBISHI CHEM CORP0 citations62
US12110450B2Oct 8, 2024
Diverting agent and method of filling fracture in well using same
MITSUBISHI CHEM CORP0 citations61
US12054667B2Aug 6, 2024
Diverting agent and method of filling fracture in well using same
MITSUBISHI CHEM CORP0 citations61
MITSUBISHI ELECTRIC CORP
4 patentsUS6202490B1Mar 20, 2001
Nondestructive testing apparatus
MITSUBISHI ELECTRIC CORP14 citations73
US5769173AJun 23, 1998
Vibration exciter machine
MITSUBISHI ELECTRIC CORP12 citations73
US5612495AMar 18, 1997
Non-destructive examination device
MITSUBISHI ELECTRIC CORP14 citations73
US6804875B2Oct 19, 2004
Method of mounting elastic wave generator
MITSUBISHI ELECTRIC CORP2 citations62