P

Inventor

HSIEH YUN CHEN

TW21 patents

Patents

21 patents
US10361122B1Jul 23, 2019

Processes for reducing leakage and improving adhesion

TAIWAN SEMICONDUCTOR MFG CO LTD14 citations94
US11651994B2May 16, 2023

Processes for reducing leakage and improving adhesion

TAIWAN SEMICONDUCTOR MFG CO LTD5 citations86
US10964591B2Mar 30, 2021

Processes for reducing leakage and improving adhesion

TAIWAN SEMICONDUCTOR MFG CO LTD7 citations84
US10515848B1Dec 24, 2019

Semiconductor package and method

TAIWAN SEMICONDUCTOR MFG CO LTD9 citations84
US11404308B2Aug 2, 2022

Semiconductor package and method

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US10971442B2Apr 6, 2021

Semiconductor device having via sidewall adhesion with encapsulant

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US10840129B2Nov 17, 2020

Semiconductor package and method

TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US11587902B2Feb 21, 2023

Semiconductor structure and method of forming the same

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations72
US10522501B2Dec 31, 2019

Semiconductor structure and method of forming the same

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US10186462B2Jan 22, 2019

Semiconductor device and method

TAIWAN SEMICONDUCTOR MFG CO LTD4 citations72
US12315819B2May 27, 2025

Method of forming RDLs and structure formed thereof

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12062603B2Aug 13, 2024

Semiconductor device having via sidewall adhesion with encapsulant

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12020983B2Jun 25, 2024

Processes for reducing leakage and improving adhesion

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11742317B2Aug 29, 2023

Process including a re-etching process for forming a semiconductor structure

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11600574B2Mar 7, 2023

Method of forming RDLS and structure formed thereof

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11527466B2Dec 13, 2022

Semiconductor device having via sidewall adhesion with encapsulant

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US10892228B2Jan 12, 2021

Method of manufacturing conductive feature and method of manufacturing package

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US10886231B2Jan 5, 2021

Method of forming RDLS and structure formed thereof

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US10867874B2Dec 15, 2020

Semiconductor device and method

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
US10297551B2May 21, 2019

Method of manufacturing redistribution circuit structure and method of manufacturing integrated fan-out package

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US12381176B2Aug 5, 2025

Semiconductor structure having a conductive feature comprising an adhesion layer and a metal region over and contacting the adhesion layer

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51