Inventor
CHIU WEI-CHAO
TW15 patents
⚠️ This page may combine multiple inventors who share the name “CHIU WEI-CHAO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
13 patentsUS10121811B1Nov 6, 2018
Method of high-aspect ratio pattern formation with submicron pixel pitch
TAIWAN SEMICONDUCTOR MFG CO LTD12 citations83
US10090357B2Oct 2, 2018
Method of using a surfactant-containing shrinkage material to prevent photoresist pattern collapse caused by capillary forces
TAIWAN SEMICONDUCTOR MFG CO LTD5 citations83
US10734436B2Aug 4, 2020
Method of using a surfactant-containing shrinkage material to prevent photoresist pattern collapse caused by capillary forces
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations72
US10546889B2Jan 28, 2020
Method of high-aspect ratio pattern formation with submicron pixel pitch
TAIWAN SEMICONDUCTOR MFG CO LTD5 citations72
US10186542B1Jan 22, 2019
Patterning for substrate fabrication
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations72
US12532561B2Jan 20, 2026
Image sensor device and manufacturing method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11996432B2May 28, 2024
Image sensor device and manufacturing method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11086221B2Aug 10, 2021
Method of using a surfactant-containing shrinkage material to prevent photoresist pattern collapse caused by capillary forces
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12293940B2May 6, 2025
Techniques for forming a deep trench isolation structure between photodiodes by forming a first set of trenches based on a first pattern and forming a second set of trenches based on a second pattern
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US12100592B2Sep 24, 2024
Implantation mask formation
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US11658031B2May 23, 2023
Implantation mask formation
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations61
US11411033B2Aug 9, 2022
Image sensor device and manufacturing method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US9627262B2Apr 18, 2017
Method of patterning features of a semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52