Inventor

SHIU FENG-JIA

TW52 patents

⚠️ This page may combine multiple inventors who share the name “SHIU FENG-JIA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SHIU FENG-JIA

TAIWAN SEMICONDUCTOR MFG CO LTD

VIA structure and methods of forming the same

Method of high-aspect ratio pattern formation with submicron pixel pitch

Method of using a surfactant-containing shrinkage material to prevent photoresist pattern collapse caused by capillary forces

Semiconductor imaging device having improved dark current performance

Method for manufacturing semiconductor device

Semiconductor device and methods of manufacturing thereof

Method of using a surfactant-containing shrinkage material to prevent photoresist pattern collapse caused by capillary forces

Method of high-aspect ratio pattern formation with submicron pixel pitch

Patterning for substrate fabrication

Method of planarizating film

Method for reducing charging of semiconductor wafers

Semiconductor imaging device having improved dark current performance

Semiconductor imaging device having improved dark current performance

Semiconductor imaging device having improved dark current performance

Image sensor device and manufacturing method thereof

Via structure and methods of forming the same

Via structure and methods of forming the same

Image sensor device and manufacturing method thereof

VIA structure and methods of forming the same

Method of using a surfactant-containing shrinkage material to prevent photoresist pattern collapse caused by capillary forces

VIA structure and methods of forming the same

Method for manufacturing semiconductor device

Semiconductor device and methods of manufacturing thereof

Techniques for forming a deep trench isolation structure between photodiodes by forming a first set of trenches based on a first pattern and forming a second set of trenches based on a second pattern

Method for reducing charging of semiconductor wafers

Implantation mask formation

Improving surface topography by forming spacer-like components

Implantation mask formation

Methods of manufacturing semiconductor device and semiconductor device

Surface topography by forming spacer-like components

Methods of manufacturing semiconductor device and semiconductor device

Method for manufacturing a semiconductor device

Image sensor device and manufacturing method thereof

System and method for lithography alignment

Surface topography by forming spacer-like components

TAIWAN SEMICONDUCTOR MFG

System and method for lithography alignment

Method of fabricating backside illuminated image sensor

Method to make minimal spacing between floating gates in split gate flash

Methods to improve photonic performances of photo-sensitive integrated circuits

Method of fabricating backside illuminated image sensor

Method of fabricating backside illuminated image sensor

Method of fabricating a metal grid for semiconductor device

Method for reducing crosstalk in image sensors using implant technology

TIAWAN SEMICONDUCTOR MFG CO LT

Lens structures suitable for use in image sensors and method for making the same

WANG SHIH WEI

Method for reducing topography of non-volatile memory and resulting memory cells

KAO YA-CHEN

MRAM cell structure with a blocking layer for avoiding short circuits

LIU JEN-CHENG

Method for reducing crosstalk in image sensors using implant technology

LAN SHUN-WEI

Planarization method for high wafer topography

HSU ALEX

Method of measurement in semiconductor fabrication

CHOU HSING-FEI

Methods of forming semiconductor structures