Inventor

TZENG KAI

TW13 patents

⚠️ This page may combine multiple inventors who share the name “TZENG KAI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TAIWAN SEMICONDUCTOR MFG CO LTD

9 patents

US10121811B1Nov 6, 2018

Method of high-aspect ratio pattern formation with submicron pixel pitch

TAIWAN SEMICONDUCTOR MFG CO LTD12 citations83

US10090357B2Oct 2, 2018

Method of using a surfactant-containing shrinkage material to prevent photoresist pattern collapse caused by capillary forces

TAIWAN SEMICONDUCTOR MFG CO LTD5 citations83

US10734436B2Aug 4, 2020

Method of using a surfactant-containing shrinkage material to prevent photoresist pattern collapse caused by capillary forces

TAIWAN SEMICONDUCTOR MFG CO LTD3 citations72

US10546889B2Jan 28, 2020

Method of using a surfactant-containing shrinkage material to prevent photoresist pattern collapse caused by capillary forces

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62

US9401384B2Jul 26, 2016

Method of preparing self-aligned isolation regions between sensor elements

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51

US12426284B2Sep 23, 2025

Semiconductor device with inductive component and method of forming

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations48

TAIWAN SEMICONDUCTOR MFG

3 patents

US8367512B2Feb 5, 2013

Self-aligned implants to reduce cross-talk of imaging sensors

TAIWAN SEMICONDUCTOR MFG8 citations83

US8766406B2Jul 1, 2014

Self-aligned implants to reduce cross-talk of imaging sensors

TAIWAN SEMICONDUCTOR MFG3 citations62

US6951803B2Oct 4, 2005

Method to prevent passivation layer peeling in a solder bump formation process

TAIWAN SEMICONDUCTOR MFG3 citations57

FU SHIH-CHI

1 patent

US9171876B2Oct 27, 2015

Self-aligned implants to reduce cross-talk of imaging sensors

FU SHIH-CHI1 citations59

TZENG KAI

TAIWAN SEMICONDUCTOR MFG CO LTD

Method of high-aspect ratio pattern formation with submicron pixel pitch

Method of using a surfactant-containing shrinkage material to prevent photoresist pattern collapse caused by capillary forces

Method of using a surfactant-containing shrinkage material to prevent photoresist pattern collapse caused by capillary forces

Method of high-aspect ratio pattern formation with submicron pixel pitch

Patterning for substrate fabrication

Recessed inductor structure to reduce step height

Method of using a surfactant-containing shrinkage material to prevent photoresist pattern collapse caused by capillary forces

Method of preparing self-aligned isolation regions between sensor elements

Semiconductor device with inductive component and method of forming

TAIWAN SEMICONDUCTOR MFG

Self-aligned implants to reduce cross-talk of imaging sensors

Self-aligned implants to reduce cross-talk of imaging sensors

Method to prevent passivation layer peeling in a solder bump formation process

FU SHIH-CHI

Self-aligned implants to reduce cross-talk of imaging sensors