P

Inventor

CHEN SHIH-CHUNG

US51 patents
⚠️ This page may combine multiple inventors who share the name “CHEN SHIH-CHUNG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

APPLIED MATERIALS INC

25 patents
US10014185B1Jul 3, 2018

Selective etch of metal nitride films

APPLIED MATERIALS INC22 citations92
US10790287B2Sep 29, 2020

Reducing gate induced drain leakage in DRAM wordline

APPLIED MATERIALS INC12 citations86
US9914999B2Mar 13, 2018

Oxidized showerhead and process kit parts and methods of using same

APPLIED MATERIALS INC10 citations84
US11552082B2Jan 10, 2023

Reducing gate induced drain leakage in DRAM wordline

APPLIED MATERIALS INC2 citations73
US10608097B2Mar 31, 2020

Low thickness dependent work-function nMOS integration for metal gate

APPLIED MATERIALS INC2 citations73
US9748354B2Aug 29, 2017

Multi-threshold voltage structures with a lanthanum nitride film and methods of formation thereof

APPLIED MATERIALS INC5 citations73
US8987080B2Mar 24, 2015

Methods for manufacturing metal gates

APPLIED MATERIALS INC4 citations73
US11658218B2May 23, 2023

P-type dipole for p-FET

APPLIED MATERIALS INC2 citations72
US11289579B2Mar 29, 2022

P-type dipole for p-FET

APPLIED MATERIALS INC4 citations72
US11245022B2Feb 8, 2022

Integrated dipole flow for transistor

APPLIED MATERIALS INC2 citations72
US10872763B2Dec 22, 2020

Treatments to enhance material structures

APPLIED MATERIALS INC5 citations71
US9145612B2Sep 29, 2015

Deposition of N-metal films comprising aluminum alloys

APPLIED MATERIALS INC3 citations63
US11996455B2May 28, 2024

P-type dipole for P-FET

APPLIED MATERIALS INC0 citations62
US11171047B2Nov 9, 2021

Fluorine-doped nitride films for improved high-k reliability

APPLIED MATERIALS INC0 citations62
US11062900B2Jul 13, 2021

Method of reducing effective oxide thickness in a semiconductor structure

APPLIED MATERIALS INC1 citations62
US12328872B2Jun 10, 2025

Liner for V-NAND word line stack

APPLIED MATERIALS INC0 citations61
US11888045B2Jan 30, 2024

Integrated dipole flow for transistor

APPLIED MATERIALS INC0 citations61
US11776980B2Oct 3, 2023

Methods for reflector film growth

APPLIED MATERIALS INC0 citations61
US11476267B2Oct 18, 2022

Liner for V-NAND word line stack

APPLIED MATERIALS INC0 citations61
US11075276B2Jul 27, 2021

Methods and apparatus for n-type metal oxide semiconductor (NMOS) metal gate materials using atomic layer deposition (ALD) processes with metal based precursors

APPLIED MATERIALS INC1 citations60
US10665450B2May 26, 2020

Methods and apparatus for doping engineering and threshold voltage tuning by integrated deposition of titanium nitride and aluminum films

APPLIED MATERIALS INC0 citations52
US9683287B2Jun 20, 2017

Deposition of films comprising aluminum alloys with high aluminum content

APPLIED MATERIALS INC0 citations52
US12062545B2Aug 13, 2024

Fluorine-free tungsten ALD for dielectric selectivity improvement

APPLIED MATERIALS INC0 citations49
US12588443B2Mar 24, 2026

Methods for forming low resistivity contacts

APPLIED MATERIALS INC0 citations48
US12305278B2May 20, 2025

Method of reducing titanium nitride etching during tungsten film formation

APPLIED MATERIALS INC0 citations48

TAIWAN SEMICONDUCTOR MFG CO LTD

9 patents

CHEN SHIH CHUNG

6 patents

GANGULI SESHADRI

2 patents

TAIWAN SEMICONDUCTOR MFG

1 patent

CHEN SHIH-CHUNG

1 patent

(unassigned)

1 patent

SUN CHEMICAL CORP

1 patent

ASTA OPTICAL CO INC

1 patent

LU XINLIANG

1 patent

CHEN CHI HSIANG INDUSTRY LTD

1 patent

GREEN HYDROTEC INC

1 patent

Showing the top 50 of 51 patents by PatentIndex Score.