Inventor
LIU PATRICIA M
US37 patents
⚠️ This page may combine multiple inventors who share the name “LIU PATRICIA M”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
35 patentsUS6454860B2Sep 24, 2002
Deposition reactor having vaporizing, mixing and cleaning capabilities
APPLIED MATERIALS INC692 citations98
US6204203B1Mar 20, 2001
Post deposition treatment of dielectric films for interface control
APPLIED MATERIALS INC271 citations98
US6274058B1Aug 14, 2001
Remote plasma cleaning method for processing chambers
APPLIED MATERIALS INC106 citations94
US7837838B2Nov 23, 2010
Method of fabricating a high dielectric constant transistor gate using a low energy plasma apparatus
APPLIED MATERIALS INC20 citations92
US9048183B2Jun 2, 2015
NMOS metal gate materials, manufacturing methods, and equipment using CVD and ALD processes with metal based precursors
APPLIED MATERIALS INC14 citations84
US7645710B2Jan 12, 2010
Method and apparatus for fabricating a high dielectric constant transistor gate using a low energy plasma system
APPLIED MATERIALS INC13 citations83
US11152479B2Oct 19, 2021
Semiconductor device, method of making a semiconductor device, and processing system
APPLIED MATERIALS INC3 citations73
US11152221B2Oct 19, 2021
Methods and apparatus for metal silicide deposition
APPLIED MATERIALS INC2 citations73
US11261538B1Mar 1, 2022
In-situ temperature mapping for epi chamber
APPLIED MATERIALS INC3 citations72
US10861722B2Dec 8, 2020
Integrated semiconductor processing
APPLIED MATERIALS INC6 citations72
US7678710B2Mar 16, 2010
Method and apparatus for fabricating a high dielectric constant transistor gate using a low energy plasma system
APPLIED MATERIALS INC7 citations72
US11195923B2Dec 7, 2021
Method of fabricating a semiconductor device having reduced contact resistance
APPLIED MATERIALS INC5 citations71
US10872763B2Dec 22, 2020
Treatments to enhance material structures
APPLIED MATERIALS INC5 citations71
US12249626B2Mar 11, 2025
Arsenic diffusion profile engineering for transistors
APPLIED MATERIALS INC0 citations62
US11901182B2Feb 13, 2024
Silicide film nucleation
APPLIED MATERIALS INC0 citations62
US11615986B2Mar 28, 2023
Methods and apparatus for metal silicide deposition
APPLIED MATERIALS INC0 citations62
US11456178B2Sep 27, 2022
Gate interface engineering with doped layer
APPLIED MATERIALS INC0 citations62
US11309404B2Apr 19, 2022
Integrated CMOS source drain formation with advanced control
APPLIED MATERIALS INC1 citations62
US11195914B2Dec 7, 2021
Transistor and method for forming a transistor
APPLIED MATERIALS INC0 citations62
US11081358B2Aug 3, 2021
Silicide film nucleation
APPLIED MATERIALS INC0 citations62
US10971366B2Apr 6, 2021
Methods for silicide deposition
APPLIED MATERIALS INC0 citations62
US12449309B2Oct 21, 2025
Methods for detection using optical emission spectroscopy
APPLIED MATERIALS INC0 citations60
US11860973B2Jan 2, 2024
Method and system for foreline deposition diagnostics and control
APPLIED MATERIALS INC1 citations60
US11271097B2Mar 8, 2022
Cap oxidation for FinFET formation
APPLIED MATERIALS INC0 citations60
US8658522B2Feb 25, 2014
Methods and apparatus for incorporating nitrogen in oxide films
APPLIED MATERIALS INC1 citations60
US7913645B2Mar 29, 2011
Methods and apparatus for incorporating nitrogen in oxide films
APPLIED MATERIALS INC2 citations60
US7902050B2Mar 8, 2011
Methods and apparatus for incorporating nitrogen in oxide films
APPLIED MATERIALS INC2 citations60
US11733081B2Aug 22, 2023
Methods, systems, and apparatus for conducting a calibration operation for a plurality of mass flow controllers (MFCs) of a substrate processing system
APPLIED MATERIALS INC1 citations59
US12165934B2Dec 10, 2024
Substrate processing monitoring
APPLIED MATERIALS INC0 citations58
US11037838B2Jun 15, 2021
In-situ integrated chambers
APPLIED MATERIALS INC0 citations51
US8375892B2Feb 19, 2013
Methods and apparatus for incorporating nitrogen in oxide films
APPLIED MATERIALS INC0 citations50
US12196617B2Jan 14, 2025
Temperature profile measurement and synchronized control on substrate and susceptor in an epitaxy chamber
APPLIED MATERIALS INC0 citations49
US12227847B2Feb 18, 2025
Level monitoring and active adjustment of a substrate support assembly
APPLIED MATERIALS INC0 citations48
US12526971B2Jan 13, 2026
Reduced strain Si/SiGe heteroepitaxy stacks for 3D DRAM
APPLIED MATERIALS INC0 citations46
US9437640B2Sep 6, 2016
Engineering induced tunable electrostatic effect
APPLIED MATERIALS INC0 citations45