Inventor

LUBOMIRSKY DMITRY

US226 patents

⚠️ This page may combine multiple inventors who share the name “LUBOMIRSKY DMITRY”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

LUBOMIRSKY DMITRY

APPLIED MATERIALS INC

Processing systems and methods for halide scavenging

Chamber with flow-through source

Radial waveguide systems and methods for post-match control of microwaves

Processing systems and methods for halide scavenging

Processing systems and methods for halide scavenging

Selective titanium nitride removal

Radial waveguide systems and methods for post-match control of microwaves

Processing systems and methods for halide scavenging

Enhanced etching processes using remote plasma sources

Systems and methods for internal surface conditioning in plasma processing equipment

Radial waveguide systems and methods for post-match control of microwaves

Radial waveguide systems and methods for post-match control of microwaves

Processing systems and methods for halide scavenging

Processing systems and methods for halide scavenging

Semiconductor processing system and methods using capacitively coupled plasma

Processing systems and methods for halide scavenging

Selective titanium nitride removal

Processing systems and methods for halide scavenging

Flowable dielectric equipment and processes

Method and system for improving dielectric film quality for void free gap fill

Measurement techniques for controlling aspects of a electroless deposition process

Process chamber for etching low K and other dielectric films

Oxygen compatible plasma source

Chemical control features in wafer process equipment

Systems and methods for internal surface conditioning assessment in plasma processing equipment

Conditioned semiconductor system parts

Thermal management systems and methods for wafer processing systems

High temperature chuck for plasma processing systems

Particle generation suppressor by DC bias modulation

Layered thin film heater and method of fabrication

Heat treated ceramic substrate having ceramic coating and heat treatment for coated ceramics

Chemical control features in wafer process equipment

Polarity control for remote plasma

Ceramic coated article and process for applying ceramic coating

Remote plasma source seasoning

Apparatus for electroless deposition

Chemical control features in wafer process equipment

Dual discharge modes operation for remote plasma

Method of patterning a silicon nitride dielectric film

Method of patterning a low-k dielectric film

Shaping a plasma with a magnetic field to control etch rate uniformity

Semiconductor process chamber having improved gas distributor

Generation of compact alumina passivation layers on aluminum plasma equipment components

Bolted wafer chuck thermal management systems and methods for wafer processing systems

Gas distribution plate

Temperature control system for process chamber

LUBOMIRSKY DMITRY

Electrostatic chuck with advanced RF and temperature uniformity

Gas distribution plate with discrete protective elements

NEMANI SRINIVAS D

Method of patterning a low-k dielectric film

CHUC KIEN N

Flow control features of CVD chambers