Inventor
KIM BYEUNG CHUL
US34 patents
⚠️ This page may combine multiple inventors who share the name “KIM BYEUNG CHUL”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MICRON TECHNOLOGY INC
21 patentsUS10777576B1Sep 15, 2020
Integrated assemblies having charge-trapping material arranged in vertically-spaced segments, and methods of forming integrated assemblies
MICRON TECHNOLOGY INC12 citations85
US10770465B1Sep 8, 2020
Method used in forming integrated circuitry
MICRON TECHNOLOGY INC7 citations84
US11037956B2Jun 15, 2021
Integrated assemblies having charge-trapping material arranged in vertically-spaced segments, and methods of forming integrated assemblies
MICRON TECHNOLOGY INC4 citations83
US11171153B2Nov 9, 2021
Integrated assemblies having improved charge migration
MICRON TECHNOLOGY INC2 citations73
US11081497B2Aug 3, 2021
Integrated assemblies having vertically-spaced channel material segments, and methods of forming integrated assemblies
MICRON TECHNOLOGY INC4 citations73
US11672118B2Jun 6, 2023
Electronic devices comprising adjoining oxide materials and related systems
MICRON TECHNOLOGY INC2 citations72
US11107830B2Aug 31, 2021
Integrated assemblies having vertically-spaced channel material segments, and methods of forming integrated assemblies
MICRON TECHNOLOGY INC3 citations72
US12557289B2Feb 17, 2026
Electronic devices comprising adjoining oxide materials and related systems
MICRON TECHNOLOGY INC0 citations62
US12052862B2Jul 30, 2024
Microelectronic devices including stack structures having air gaps, and related memory devices, electronic systems, and methods
MICRON TECHNOLOGY INC0 citations62
US11631697B2Apr 18, 2023
Integrated assemblies having vertically-extending channel material with alternating regions of different dopant distributions, and methods of forming integrated assemblies
MICRON TECHNOLOGY INC0 citations62
US11587948B2Feb 21, 2023
Integrated assemblies having vertically-spaced channel material segments, and methods of forming integrated assemblies
MICRON TECHNOLOGY INC0 citations62
US11557608B2Jan 17, 2023
Integrated assemblies having vertically-spaced channel material segments, and methods of forming integrated assemblies
MICRON TECHNOLOGY INC0 citations62
US11289501B2Mar 29, 2022
Integrated assemblies having vertically-extending channel material with alternating regions of different dopant distributions, and methods of forming integrated assemblies
MICRON TECHNOLOGY INC0 citations62
US10930548B2Feb 23, 2021
Methods of forming an apparatus for making semiconductor dieves
MICRON TECHNOLOGY INC0 citations62
US12543543B2Feb 3, 2026
Selective cavity merging for isolation regions in a memory die
MICRON TECHNOLOGY INC0 citations59
US10943907B2Mar 9, 2021
Integrated circuitry comprising an array, method of forming an array, method of forming DRAM circuitry, and method used in the fabrication of integrated circuitry
MICRON TECHNOLOGY INC0 citations58
US12575102B2Mar 10, 2026
Merged cavities and buried etch stops for three-dimensional memory arrays
MICRON TECHNOLOGY INC0 citations52
US12082416B2Sep 3, 2024
Integrated assemblies and methods of forming integrated assemblies
MICRON TECHNOLOGY INC0 citations49
US10707211B2Jul 7, 2020
Integrated circuitry comprising an array, method of forming an array, method of forming DRAM circuitry, and method used in the fabrication of integrated circuitry
MICRON TECHNOLOGY INC0 citations48
US12568621B2Mar 3, 2026
Memory apparatus and methods including merged process for memory cell pillar and source structure
MICRON TECHNOLOGY INC0 citations47
US12477730B2Nov 18, 2025
Electronic devices comprising segmented high-k dielectric materials and storage node materials, related systems, and methods of forming
MICRON TECHNOLOGY INC0 citations46
SAMSUNG ELECTRONICS CO LTD
9 patentsUS5716885AFeb 10, 1998
Method for manufacturing NAND type mask-ROM having improved cell current
SAMSUNG ELECTRONICS CO LTD9 citations74
US6404020B1Jun 11, 2002
Method of forming contact pads in a semiconductor device and a semiconductor device formed using the method
SAMSUNG ELECTRONICS CO LTD9 citations73
US6184075B1Feb 6, 2001
Method of fabricating interconnect lines and plate electrodes of a storage capacitor in a semiconductor device
SAMSUNG ELECTRONICS CO LTD8 citations73
US5714038AFeb 3, 1998
Method for forming contact hole of semiconductor device
SAMSUNG ELECTRONICS CO LTD11 citations73
US5736447AApr 7, 1998
Method for manufacturing a bipolar junction transistor having a polysilicon emitter
SAMSUNG ELECTRONICS CO LTD8 citations72
US5650956AJul 22, 1997
Current amplification type mask-ROM
SAMSUNG ELECTRONICS CO LTD17 citations72
US8811062B2Aug 19, 2014
Variable resistance memory device and method of manufacturing the same
SAMSUNG ELECTRONICS CO LTD3 citations62
US5751045AMay 12, 1998
Nand type non-volatile memory device
SAMSUNG ELECTRONICS CO LTD3 citations61
US6090662AJul 18, 2000
Method of fabricating interconnect lines and plate electrodes of a storage capacitor in a semiconductor device
SAMSUNG ELECTRONICS CO LTD0 citations52
LODESTAR LICENSING GROUP LLC
2 patentsUS12156406B2Nov 26, 2024
Methods of forming integrated assemblies with improved charge migration impedance
LODESTAR LICENSING GROUP LLC0 citations62
US12150303B2Nov 19, 2024
Integrated assemblies having charge-trapping material arranged in vertically-spaced segments, and methods of forming integrated assemblies
LODESTAR LICENSING GROUP LLC0 citations62