Inventor
LANE BARTON
US34 patents
⚠️ This page may combine multiple inventors who share the name “LANE BARTON”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
24 patentsUS10991554B2Apr 27, 2021
Plasma processing system with synchronized signal modulation
TOKYO ELECTRON LTD49 citations94
US9396900B2Jul 19, 2016
Radio frequency (RF) power coupling system utilizing multiple RF power coupling elements for control of plasma properties
TOKYO ELECTRON LTD10 citations84
US11600474B2Mar 7, 2023
RF voltage and current (V-I) sensors and measurement methods
TOKYO ELECTRON LTD6 citations74
US11515122B2Nov 29, 2022
System and methods for VHF plasma processing
TOKYO ELECTRON LTD2 citations73
US11410832B2Aug 9, 2022
RF measurement system and method
TOKYO ELECTRON LTD2 citations73
US11348761B2May 31, 2022
Impedance matching apparatus and control method
TOKYO ELECTRON LTD4 citations73
US11201035B2Dec 14, 2021
Radical source with contained plasma
TOKYO ELECTRON LTD2 citations73
US10861679B2Dec 8, 2020
Resonant structure for a plasma processing system
TOKYO ELECTRON LTD2 citations73
US11817296B2Nov 14, 2023
RF voltage and current (V-I) sensors and measurement methods
TOKYO ELECTRON LTD2 citations72
US12451327B2Oct 21, 2025
Apparatus for plasma processing
TOKYO ELECTRON LTD1 citations64
US12500067B2Dec 16, 2025
Apparatus for edge control during plasma processing
TOKYO ELECTRON LTD0 citations62
US12224164B2Feb 11, 2025
Radio frequency (RF) system with embedded RF signal pickups
TOKYO ELECTRON LTD0 citations62
US12176183B2Dec 24, 2024
RF voltage and current (V-I) sensors and measurement methods
TOKYO ELECTRON LTD0 citations62
US12119207B2Oct 15, 2024
Apparatus for plasma processing
TOKYO ELECTRON LTD0 citations62
US11393663B2Jul 19, 2022
Methods and systems for focus ring thickness determinations and feedback control
TOKYO ELECTRON LTD1 citations62
US11043362B2Jun 22, 2021
Plasma processing apparatuses including multiple electron sources
TOKYO ELECTRON LTD0 citations62
US11037765B2Jun 15, 2021
Resonant structure for electron cyclotron resonant (ECR) plasma ionization
TOKYO ELECTRON LTD1 citations62
US12074390B2Aug 27, 2024
Parallel resonance antenna for radial plasma control
TOKYO ELECTRON LTD1 citations61
US12261017B2Mar 25, 2025
Resonant antenna for physical vapor deposition applications
TOKYO ELECTRON LTD0 citations56
US12531205B2Jan 20, 2026
Equipment and method for improved edge uniformity of plasma processing of wafers
TOKYO ELECTRON LTD0 citations51
US12412748B2Sep 9, 2025
Plasma processing with magnetic ring X point
TOKYO ELECTRON LTD0 citations51
US12272520B2Apr 8, 2025
Process control enabled VDC sensor for plasma process
TOKYO ELECTRON LTD0 citations51
US11942307B2Mar 26, 2024
Plasma processing with radio frequency (RF) source and bias signal waveforms
TOKYO ELECTRON LTD0 citations51
US9130536B2Sep 8, 2015
Radio frequency signal splitter and matcher
TOKYO ELECTRON LTD0 citations42
PIVOTAL SYSTEMS CORP
4 patentsUS7757541B1Jul 20, 2010
Techniques for calibration of gas flows
PIVOTAL SYSTEMS CORP23 citations92
US7695984B1Apr 13, 2010
Use of modeled parameters for real-time semiconductor process metrology applied to semiconductor processes
PIVOTAL SYSTEMS CORP8 citations84
US7871830B2Jan 18, 2011
End point detection method for plasma etching of semiconductor wafers with low exposed area
PIVOTAL SYSTEMS CORP9 citations74
US7940395B2May 10, 2011
Method and apparatus for identifying the chemical composition of a gas
PIVOTAL SYSTEMS CORP6 citations73