Inventor

STAFFORD NATHAN

US31 patents

⚠️ This page may combine multiple inventors who share the name “STAFFORD NATHAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

STAFFORD NATHAN

AIR LIQUIDE AMERICAN

Method to improve profile control during selective etching of silicon nitride spacers

Purification of trimethylamine

Fluorocarbon molecules for high aspect ratio oxide etch

Chemistries for TSV/MEMS/power device etching

Chemistries for TSV/MEMS/power device etching

Iodine-containing compounds for etching semiconductor structures

Iodine-containing compounds for etching semiconductor structures

Hydrofluorocarbons containing —NH2 functional group for 3D NAND and DRAM applications

Method of etching semiconductor structures with etch gas

Method to improve profile control during selective etching of silicon nitride spacers

Deposition of iodine-containing carbon films

Method to improve profile control during selective etching of silicon nitride spacers

Method to improve profile control during selective etching of silicon nitride spacers

Selective adsorption of halocarbon impurities containing cl, br and i in fluorocarbons or hydrofluorocarbons using adsorbent supported metal oxide

Chemistries for TSV/MEMS/power device etching

Fluorocarbon molecules for high aspect ratio oxide etch

Method of etching semiconductor structures with etch gas

Etching methods with alternating non-plasma and plasma etching processes

Method of running an etch process in higher selectivity to mask and polymer regime by using a cyclic etch process

High conductive passivation layers and method of forming the same during high aspect ratio plasma etching

AIR LIQUIDE

Fluorocarbon molecules for high aspect ratio oxide etch

SiN selective etch to SiO2 with non-plasma dry process for 3D NAND device applications

Sulfur-containing molecules for high aspect ratio plasma etching processes

Systems and methods for storage and supply of F3NO-free FNO gases and F3NO-free FNO gas mixtures for semiconductor processes

Methods of minimizing plasma-induced sidewall damage during low K etch processes

SAMSUNG ELECTRONICS CO LTD

Etching gas mixture and method of manufacturing integrated circuit device using the same

DONIAT FRANCOIS

Methods for checking and calibrating concentration sensors in a semiconductor processing chamber

AIR LIQUIDE ELECTRONICS US LP

Purification of H2Se

LAIR LIQUIDE SA POUR LETUDE ET LEXPLOITATION DES PROCEDES GEORGES CLUADEQ

Methods for minimizing sidewall damage during low k etch processes

STAFFORD NATHAN

Low decomposition storage of a tantalum precursor

ERTAN ASLI

Methods of purifying COS