Inventor
EDELSTEIN DANIEL CHARLES
US42 patents
⚠️ This page may combine multiple inventors who share the name “EDELSTEIN DANIEL CHARLES”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IBM
41 patentsUS6181012B1Jan 30, 2001
Copper interconnection structure incorporating a metal seed layer
IBM335 citations99
US6114937ASep 5, 2000
Integrated circuit spiral inductor
IBM258 citations99
US6103096AAug 15, 2000
Apparatus and method for the electrochemical etching of a wafer
IBM219 citations99
US6054329AApr 25, 2000
Method of forming an integrated circuit spiral inductor with ferromagnetic liner
IBM106 citations99
US5884990AMar 23, 1999
Integrated circuit inductor
IBM320 citations99
US5793272AAug 11, 1998
Integrated circuit toroidal inductor
IBM295 citations99
US6399496B1Jun 4, 2002
Copper interconnection structure incorporating a metal seed layer
IBM94 citations98
US6709562B1Mar 23, 2004
Method of making electroplated interconnection structures on integrated circuit chips
IBM90 citations97
US6323128B1Nov 27, 2001
Method for forming Co-W-P-Au films
IBM292 citations97
US7276787B2Oct 2, 2007
Silicon chip carrier with conductive through-vias and method for fabricating same
IBM124 citations96
US6291885B1Sep 18, 2001
Thin metal barrier for electrical interconnections
IBM85 citations95
US5679269AOct 21, 1997
Diamond-like carbon for use in VLSI and ULSI interconnect systems
IBM66 citations95
US5674355AOct 7, 1997
Diamond-like carbon for use in VLSI and ULSI interconnect systems
IBM46 citations95
US6646345B2Nov 11, 2003
Method for forming Co-W-P-Au films
IBM45 citations94
US6437440B1Aug 20, 2002
Thin film metal barrier for electrical interconnections
IBM59 citations93
US6133136AOct 17, 2000
Robust interconnect structure
IBM77 citations93
US6548901B1Apr 15, 2003
Cu/low-k BEOL with nonconcurrent hybrid dielectric interface
IBM22 citations92
US6270646B1Aug 7, 2001
Electroplating apparatus and method using a compressible contact
IBM82 citations92
US6091273AJul 18, 2000
Voltage limiting circuit for fuse technology
IBM29 citations92
US6486557B1Nov 26, 2002
Hybrid dielectric structure for improving the stiffness of back end of the line structures
IBM48 citations91
US9536780B1Jan 3, 2017
Method and apparatus for single chamber treatment
IBM10 citations84
US6522304B2Feb 18, 2003
Dual damascene horn antenna
IBM19 citations83
US6063651AMay 16, 2000
Method for activating fusible links on a circuit substrate
IBM8 citations74
US6777809B2Aug 17, 2004
BEOL decoupling capacitor
IBM7 citations73
US6525427B2Feb 25, 2003
BEOL decoupling capacitor
IBM11 citations73
US12482747B2Nov 25, 2025
Local interconnects having different material compositions
IBM0 citations63
US12453297B2Oct 21, 2025
Recessed local interconnect semiconductor memory device
IBM0 citations63
US11955152B2Apr 9, 2024
Dielectric fill for tight pitch MRAM pillar array
IBM0 citations63
US11937514B2Mar 19, 2024
High-density memory devices using oxide gap fill
IBM0 citations63
US11031542B2Jun 8, 2021
Contact via with pillar of alternating layers
IBM0 citations63
US11462583B2Oct 4, 2022
Embedding magneto-resistive random-access memory devices between metal levels
IBM0 citations62
US12588421B2Mar 24, 2026
Memory element with a hardmask stack having different stress levels
IBM0 citations59
US12588280B2Mar 24, 2026
Backsides subtractive M1 patterning with backside contact repair for tight N2P space
IBM0 citations52
US12341099B2Jun 24, 2025
Semiconductor backside transistor integration with backside power delivery network
IBM0 citations52
US11557482B2Jan 17, 2023
Electrode with alloy interface
IBM0 citations52
US11302630B2Apr 12, 2022
Electrode-via structure
IBM0 citations52
US9824917B2Nov 21, 2017
Method and apparatus for single chamber treatment
IBM0 citations52
US9702042B1Jul 11, 2017
Method and apparatus for single chamber treatment
IBM0 citations52
US6301903B1Oct 16, 2001
Apparatus for activating fusible links on a circuit substrate
IBM0 citations52
US10892404B1Jan 12, 2021
Sacrificial buffer layer for metal removal at a bevel edge of a substrate
IBM0 citations51
US12272545B2Apr 8, 2025
Embedded metal contamination removal from BEOL wafers
IBM0 citations50