P

Inventor

EDELSTEIN DANIEL CHARLES

US42 patents
⚠️ This page may combine multiple inventors who share the name “EDELSTEIN DANIEL CHARLES”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

IBM

41 patents
US6181012B1Jan 30, 2001

Copper interconnection structure incorporating a metal seed layer

IBM335 citations99
US6114937ASep 5, 2000

Integrated circuit spiral inductor

IBM258 citations99
US6103096AAug 15, 2000

Apparatus and method for the electrochemical etching of a wafer

IBM219 citations99
US6054329AApr 25, 2000

Method of forming an integrated circuit spiral inductor with ferromagnetic liner

IBM106 citations99
US5884990AMar 23, 1999

Integrated circuit inductor

IBM320 citations99
US5793272AAug 11, 1998

Integrated circuit toroidal inductor

IBM295 citations99
US6399496B1Jun 4, 2002

Copper interconnection structure incorporating a metal seed layer

IBM94 citations98
US6709562B1Mar 23, 2004

Method of making electroplated interconnection structures on integrated circuit chips

IBM90 citations97
US6323128B1Nov 27, 2001

Method for forming Co-W-P-Au films

IBM292 citations97
US7276787B2Oct 2, 2007

Silicon chip carrier with conductive through-vias and method for fabricating same

IBM124 citations96
US6291885B1Sep 18, 2001

Thin metal barrier for electrical interconnections

IBM85 citations95
US5679269AOct 21, 1997

Diamond-like carbon for use in VLSI and ULSI interconnect systems

IBM66 citations95
US5674355AOct 7, 1997

Diamond-like carbon for use in VLSI and ULSI interconnect systems

IBM46 citations95
US6646345B2Nov 11, 2003

Method for forming Co-W-P-Au films

IBM45 citations94
US6437440B1Aug 20, 2002

Thin film metal barrier for electrical interconnections

IBM59 citations93
US6133136AOct 17, 2000

Robust interconnect structure

IBM77 citations93
US6548901B1Apr 15, 2003

Cu/low-k BEOL with nonconcurrent hybrid dielectric interface

IBM22 citations92
US6270646B1Aug 7, 2001

Electroplating apparatus and method using a compressible contact

IBM82 citations92
US6091273AJul 18, 2000

Voltage limiting circuit for fuse technology

IBM29 citations92
US6486557B1Nov 26, 2002

Hybrid dielectric structure for improving the stiffness of back end of the line structures

IBM48 citations91
US9536780B1Jan 3, 2017

Method and apparatus for single chamber treatment

IBM10 citations84
US6522304B2Feb 18, 2003

Dual damascene horn antenna

IBM19 citations83
US6063651AMay 16, 2000

Method for activating fusible links on a circuit substrate

IBM8 citations74
US6777809B2Aug 17, 2004

BEOL decoupling capacitor

IBM7 citations73
US6525427B2Feb 25, 2003

BEOL decoupling capacitor

IBM11 citations73
US12482747B2Nov 25, 2025

Local interconnects having different material compositions

IBM0 citations63
US12453297B2Oct 21, 2025

Recessed local interconnect semiconductor memory device

IBM0 citations63
US11955152B2Apr 9, 2024

Dielectric fill for tight pitch MRAM pillar array

IBM0 citations63
US11937514B2Mar 19, 2024

High-density memory devices using oxide gap fill

IBM0 citations63
US11031542B2Jun 8, 2021

Contact via with pillar of alternating layers

IBM0 citations63
US11462583B2Oct 4, 2022

Embedding magneto-resistive random-access memory devices between metal levels

IBM0 citations62
US12588421B2Mar 24, 2026

Memory element with a hardmask stack having different stress levels

IBM0 citations59
US12588280B2Mar 24, 2026

Backsides subtractive M1 patterning with backside contact repair for tight N2P space

IBM0 citations52
US12341099B2Jun 24, 2025

Semiconductor backside transistor integration with backside power delivery network

IBM0 citations52
US11557482B2Jan 17, 2023

Electrode with alloy interface

IBM0 citations52
US11302630B2Apr 12, 2022

Electrode-via structure

IBM0 citations52
US9824917B2Nov 21, 2017

Method and apparatus for single chamber treatment

IBM0 citations52
US9702042B1Jul 11, 2017

Method and apparatus for single chamber treatment

IBM0 citations52
US6301903B1Oct 16, 2001

Apparatus for activating fusible links on a circuit substrate

IBM0 citations52
US10892404B1Jan 12, 2021

Sacrificial buffer layer for metal removal at a bevel edge of a substrate

IBM0 citations51
US12272545B2Apr 8, 2025

Embedded metal contamination removal from BEOL wafers

IBM0 citations50

INT BUSINESS MACHINES CORPORATION

1 patent