Inventor
GUEVENC HACI OSMAN
DE14 patents
Patents
14 patentsUS11264250B2Mar 1, 2022
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates
BASF SE2 citations71
US10899945B2Jan 26, 2021
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt comprising substrates
BASF SE3 citations71
US10385236B2Aug 20, 2019
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates
BASF SE5 citations71
US11286402B2Mar 29, 2022
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates
BASF SE0 citations60
US10738219B2Aug 11, 2020
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates
BASF SE0 citations50
US10570316B2Feb 25, 2020
Chemical mechanical polishing (CMP) composition
BASF SE0 citations50
US12378439B2Aug 5, 2025
Compositions for tungsten etching inhibition
BASF SE0 citations49
US12351737B2Jul 8, 2025
Chemical mechanical polishing of substrates containing copper and ruthenium
BASF SE0 citations49
US11993729B2May 28, 2024
Chemical mechanical polishing composition
BASF SE0 citations49
US11725117B2Aug 15, 2023
Chemical mechanical polishing of substrates containing copper and ruthenium
BASF SE0 citations49
US10844325B2Nov 24, 2020
Composition for post chemical-mechanical-polishing cleaning
BASF SE0 citations48
US10865361B2Dec 15, 2020
Composition for post chemical-mechanical-polishing cleaning
BASF SE0 citations47
US12518960B2Jan 6, 2026
Composition comprising a siloxane and an alkane for avoiding pattern collapse when treating patterned materials with line-space dimensions of 50 NM or below
BASF SE0 citations45
US10844333B2Nov 24, 2020
Composition for post chemical-mechanical-polishing cleaning
BASF SE0 citations36