Inventor
Zhu chiyu
FI54 patents
Patents
50 patentsUS9859151B1Jan 2, 2018
Selective film deposition method to form air gaps
ASM IP HOLDING BV467 citations99
US10734497B2Aug 4, 2020
Methods for forming a semiconductor device structure and related semiconductor device structures
ASM IP HOLDING BV279 citations98
US10211308B2Feb 19, 2019
NbMC layers
ASM IP HOLDING BV412 citations98
US10190213B2Jan 29, 2019
Deposition of metal borides
ASM IP HOLDING BV413 citations98
US10847361B2Nov 24, 2020
Selective deposition of aluminum and nitrogen containing material
ASM IP HOLDING BV16 citations94
US10566185B2Feb 18, 2020
Selective deposition of aluminum and nitrogen containing material
ASM IP HOLDING BV22 citations94
US10280519B2May 7, 2019
Thermal atomic layer etching processes
ASM IP HOLDING BV14 citations94
US10283319B2May 7, 2019
Atomic layer etching processes
ASM IP HOLDING BV18 citations94
US10273584B2Apr 30, 2019
Thermal atomic layer etching processes
ASM IP HOLDING BV17 citations94
US10903113B2Jan 26, 2021
Selective deposition of aluminum and nitrogen containing material
ASM IP HOLDING BV16 citations93
US10553482B2Feb 4, 2020
Selective deposition of aluminum and nitrogen containing material
ASM IP HOLDING BV18 citations93
US10121699B2Nov 6, 2018
Selective deposition of aluminum and nitrogen containing material
ASM IP HOLDING BV23 citations93
US11295980B2Apr 5, 2022
Methods for depositing a molybdenum metal film over a dielectric surface of a substrate by a cyclical deposition process and related semiconductor device structures
ASM IP HOLDING BV14 citations92
US11739427B2Aug 29, 2023
Thermal atomic layer etching processes
ASM IP HOLDING BV2 citations84
US10662533B2May 26, 2020
Thermal atomic layer etching processes
ASM IP HOLDING BV3 citations83
US10002936B2Jun 19, 2018
Titanium aluminum and tantalum aluminum thin films
ASM IP HOLDING BV4 citations83
US11739428B2Aug 29, 2023
Thermal atomic layer etching processes
ASM IP HOLDING BV1 citations73
US11581220B2Feb 14, 2023
Methods for depositing a molybdenum metal film over a dielectric surface of a substrate by a cyclical deposition process and related semiconductor device structures
ASM IP HOLDING BV4 citations73
US11230770B2Jan 25, 2022
Thermal atomic layer etching processes
ASM IP HOLDING BV1 citations73
US11164955B2Nov 2, 2021
Methods for forming a semiconductor device structure and related semiconductor device structures
ASM IP HOLDING BV1 citations73
US11114283B2Sep 7, 2021
Reactor, system including the reactor, and methods of manufacturing and using same
ASM IP HOLDING BV4 citations73
US11094582B2Aug 17, 2021
Selective deposition method to form air gaps
ASM IP HOLDING BV3 citations73
US11056344B2Jul 6, 2021
Layer forming method
ASM IP HOLDING BV3 citations73
US10662534B2May 26, 2020
Thermal atomic layer etching processes
ASM IP HOLDING BV1 citations73
US10541173B2Jan 21, 2020
Selective deposition method to form air gaps
ASM IP HOLDING BV1 citations73
US12129545B2Oct 29, 2024
Precursor capsule, a vessel and a method
ASM IP HOLDING BV2 citations72
US11658030B2May 23, 2023
Method for forming doped metal oxide films on a substrate by cyclical deposition and related semiconductor device structures
ASM IP HOLDING BV1 citations72
US11640899B2May 2, 2023
Atomic layer etching processes
ASM IP HOLDING BV1 citations72
US11230769B2Jan 25, 2022
Thermal atomic layer etching processes
ASM IP HOLDING BV1 citations72
US10636889B2Apr 28, 2020
Titanium aluminum and tantalum aluminum thin films
ASM IP HOLDING BV1 citations72
US10607895B2Mar 31, 2020
Method for forming a semiconductor device structure comprising a gate fill metal
ASM IP HOLDING BV3 citations72
US10529563B2Jan 7, 2020
Method for forming doped metal oxide films on a substrate by cyclical deposition and related semiconductor device structures
ASM IP HOLDING BV3 citations72
US11393690B2Jul 19, 2022
Deposition method
ASM IP HOLDING BV3 citations71
US12320012B2Jun 3, 2025
Thermal atomic layer etching processes
ASM IP HOLDING BV0 citations63
US12312696B2May 27, 2025
Thermal atomic layer etching processes
ASM IP HOLDING BV0 citations63
US12094686B2Sep 17, 2024
Atomic layer etching processes
ASM IP HOLDING BV0 citations63
US11183367B2Nov 23, 2021
Atomic layer etching processes
ASM IP HOLDING BV0 citations63
US12354872B2Jul 8, 2025
Method for forming doped metal oxide films on a substrate by cyclical deposition and related semiconductor device structures
ASM IP HOLDING BV0 citations62
US12283520B2Apr 22, 2025
Selective deposition method to form air gaps
ASM IP HOLDING BV0 citations62
US12237392B2Feb 25, 2025
Titanium aluminum and tantalum aluminum thin films
ASM IP HOLDING BV0 citations62
US12166099B2Dec 10, 2024
Methods for forming a semiconductor device structure and related semiconductor device structures
ASM IP HOLDING BV0 citations62
US11854876B2Dec 26, 2023
Systems and methods for cobalt metalization
ASM IP HOLDING BV0 citations62
US11749562B2Sep 5, 2023
Selective deposition method to form air gaps
ASM IP HOLDING BV0 citations62
US11695054B2Jul 4, 2023
Methods for forming a semiconductor device structure and related semiconductor device structures
ASM IP HOLDING BV0 citations62
US11447854B2Sep 20, 2022
Process for film deposition on a substrate with non-uniform overlapping subpulses of a precursor
ASM IP HOLDING BV0 citations62
US11233133B2Jan 25, 2022
NbMC layers
ASM IP HOLDING BV0 citations62
US11139383B2Oct 5, 2021
Titanium aluminum and tantalum aluminum thin films
ASM IP HOLDING BV0 citations62
US12119228B2Oct 15, 2024
Deposition method
ASM IP HOLDING BV1 citations61
US11908736B2Feb 20, 2024
Methods for depositing a molybdenum metal film over a dielectric surface of a substrate by a cyclical deposition process and related semiconductor device structures
ASM IP HOLDING BV0 citations61
US12217954B2Feb 4, 2025
Method of cleaning a surface
ASM IP HOLDING BV0 citations60
Showing the top 50 of 54 patents by PatentIndex Score.