Inventor

KAWAMOTO YOSHIFUMI

JP41 patents

⚠️ This page may combine multiple inventors who share the name “KAWAMOTO YOSHIFUMI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

KAWAMOTO YOSHIFUMI

HITACHI LTD

Semiconductor integrated circuit device and process for manufacture the same

Fabrication system and fabrication method

Fabrication system and method having inter-apparatus transporter

Process for manufacturing vertical dynamic random access memories

Method and apparatus for fabricating semiconductor devices

Fabrication system and method having inter-apparatus transporter

Wafer transport method

Semiconductor memory device with recessed array region

Semiconductor memory device having stacked capacitor cells

Semiconductor memory device having stacked capacitor cells

Method of making a semiconductor memory device with recessed array region

Static random-access memory having multilevel conductive layer

Dram with FET stacked over capacitor

Semiconductor integrated circuit device and process for manufacturing the same

Semiconductor memory with trench capacitor

Vertical dynamic random access memory

Semiconductor memory

Wafer transport method

Semiconductor memory device with recessed array region

Method for fabricating semiconductor memory with a groove

Semiconductor device having a low-resistivity planar wiring structure

Dynamic random access memory including a logic circuit and an improved storage capacitor arrangement

Semiconductor memory device

Semiconductor memory device having stacked capacitors

Semiconductor device including arrangement for reducing junction degradation

Method of fabricating stacked capacitor cell memory devices

Semiconductor memory

Semiconductor memory

Method for manufacturing a bicmos semiconductor device

Semiconductor memory and method for fabricating the same

Semiconductor memory having stacked capacitor

Semiconductor integrated circuit and a process for producing the same

Vertical MOSFET DRAM

Method for formation of insulation film on silicon buried in trench

RENESAS TECH CORP

Fabrication system and fabrication method

Fabrication system and fabrication method

Fabrication system and fabrication method

Fabrication system and fabrication method

Semiconductor memory device

SHOWA DENKO KK

Gas for selectively etching silicon nitride and process for selectively etching silicon nitride with the gas

HITACHI VLSI

Semiconductor integrated circuit device