P

Inventor

NAKAO SHUJI

JP45 patents
⚠️ This page may combine multiple inventors who share the name “NAKAO SHUJI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

MITSUBISHI ELECTRIC CORP

27 patents
US6171662B1Jan 9, 2001

Method of surface processing

MITSUBISHI ELECTRIC CORP76 citations96
US5882827AMar 16, 1999

Phase shift mask, method of manufacturing phase shift mask and method of forming a pattern using phase shift mask

MITSUBISHI ELECTRIC CORP62 citations96
US6134008AOct 17, 2000

Aligner and patterning method using phase shift mask

MITSUBISHI ELECTRIC CORP31 citations93
US5958656ASep 28, 1999

Pattern forming method using phase shift mask

MITSUBISHI ELECTRIC CORP32 citations93
US5868849AFeb 9, 1999

Surface processing device

MITSUBISHI ELECTRIC CORP22 citations93
US5863677AJan 26, 1999

Aligner and patterning method using phase shift mask

MITSUBISHI ELECTRIC CORP30 citations93
US5858625AJan 12, 1999

Phase shifting mask, manufacturing method thereof, and exposure method using such a phase shifting mask

MITSUBISHI ELECTRIC CORP26 citations93
US5698348ADec 16, 1997

Phase shifting mask, manufacturing method thereof, and exposure method using such a phase shifting mask

MITSUBISHI ELECTRIC CORP18 citations93
US5536602AJul 16, 1996

Phase shifting mask, manufacturing method thereof, and exposure method using such a phase shifting mask

MITSUBISHI ELECTRIC CORP28 citations93
US4806829AFeb 21, 1989

Apparatus utilizing charged particles

MITSUBISHI ELECTRIC CORP25 citations93
US5744268AApr 28, 1998

Phase shift mask, method of manufacturing a phase shift mask and method of forming a pattern with phase shift mask

MITSUBISHI ELECTRIC CORP19 citations84
US5902702AMay 11, 1999

Phase shift mask, blank for phase shift mask, and method of manufacturing phase shift mask

MITSUBISHI ELECTRIC CORP17 citations83
US5853922ADec 29, 1998

Phase shifting mask, manufacturing method thereof, and exposure method using such a phase shifting mask

MITSUBISHI ELECTRIC CORP16 citations82
US6605411B2Aug 12, 2003

Method for formation of semiconductor device pattern, method for designing photo mask pattern, photo mask and process for photo mask

MITSUBISHI ELECTRIC CORP5 citations74
US6329306B1Dec 11, 2001

Fine patterning utilizing an exposure method in photolithography

MITSUBISHI ELECTRIC CORP5 citations74
US6243159B1Jun 5, 2001

Projection aligner and exposure method using the same

MITSUBISHI ELECTRIC CORP8 citations74
US5994001ANov 30, 1999

Phase shift mask and its manufacturing method and semiconductor device and its manufacturing method using the phase shift mask

MITSUBISHI ELECTRIC CORP11 citations74
US5964989AOct 12, 1999

Ionized PVD device and method of manufacturing semiconductor device

MITSUBISHI ELECTRIC CORP11 citations74
US5825668AOct 20, 1998

Monitoring method and apparatus of surface area of semiconductor wafer

MITSUBISHI ELECTRIC CORP7 citations74
US4987092AJan 22, 1991

Process for manufacturing stacked semiconductor devices

MITSUBISHI ELECTRIC CORP16 citations74
US6449386B1Sep 10, 2002

Patterned figure resolution verification method and semiconductor pattern forming method

MITSUBISHI ELECTRIC CORP6 citations63
US6388731B1May 14, 2002

Projection aligner and exposure method using the same

MITSUBISHI ELECTRIC CORP4 citations63
US6162736ADec 19, 2000

Process for fabricating a semiconductor integrated circuit utilizing an exposure method

MITSUBISHI ELECTRIC CORP3 citations63
US5962172AOct 5, 1999

Method and apparatus for manufacturing photomask and method of manufacturing a semiconductor device

MITSUBISHI ELECTRIC CORP5 citations63
US5597667AJan 28, 1997

Photomask and photomask blank

MITSUBISHI ELECTRIC CORP3 citations63
US6042977AMar 28, 2000

Method and apparatus for manufacturing photomask and method of manufacturing a semiconductor device

MITSUBISHI ELECTRIC CORP0 citations52
US6426789B1Jul 30, 2002

Aligner having shared rotation shaft

MITSUBISHI ELECTRIC CORP0 citations42

RENESAS TECH CORP

11 patents
US6709792B2Mar 23, 2004

Method for formation of semiconductor device pattern, method for designing photo mask pattern, photo mask and process for photo mask

RENESAS TECH CORP17 citations93
US6811939B2Nov 2, 2004

Focus monitoring method, focus monitoring system, and device fabricating method

RENESAS TECH CORP19 citations92
US6743554B2Jun 1, 2004

Photomask for aberration measurement, aberration measurement method unit for aberration measurement and manufacturing method for device

RENESAS TECH CORP14 citations84
US6797443B2Sep 28, 2004

Focus monitoring method, focus monitoring apparatus, and method of manufacturing semiconductor device

RENESAS TECH CORP13 citations83
US7459265B2Dec 2, 2008

Pattern forming method, semiconductor device manufacturing method and exposure mask set

RENESAS TECH CORP10 citations82
US6994940B2Feb 7, 2006

Phase shift mask, method for forming pattern using phase shift mask and manufacturing method for electronic device

RENESAS TECH CORP8 citations74
US6828080B2Dec 7, 2004

Pattern forming method and method of fabricating device

RENESAS TECH CORP9 citations74
US6764794B2Jul 20, 2004

Photomask for focus monitoring

RENESAS TECH CORP11 citations72
US6706453B2Mar 16, 2004

Method for formation of semiconductor device pattern, method for designing photo mask pattern, photo mask and process for photo mask

RENESAS TECH CORP2 citations63
US7670756B2Mar 2, 2010

Pattern forming method, semiconductor device manufacturing method and exposure mask set

RENESAS TECH CORP4 citations61
US6890692B2May 10, 2005

Method of focus monitoring and manufacturing method for an electronic device

RENESAS TECH CORP2 citations61

MINOLTA CO LTD

4 patents

RENESAS ELECTRONICS CORP

2 patents

KONICA MINOLTA BUSINESS TECH

1 patent