Inventor
NAKAO SHUJI
JP45 patents
⚠️ This page may combine multiple inventors who share the name “NAKAO SHUJI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MITSUBISHI ELECTRIC CORP
27 patentsUS6171662B1Jan 9, 2001
Method of surface processing
MITSUBISHI ELECTRIC CORP76 citations96
US5882827AMar 16, 1999
Phase shift mask, method of manufacturing phase shift mask and method of forming a pattern using phase shift mask
MITSUBISHI ELECTRIC CORP62 citations96
US6134008AOct 17, 2000
Aligner and patterning method using phase shift mask
MITSUBISHI ELECTRIC CORP31 citations93
US5958656ASep 28, 1999
Pattern forming method using phase shift mask
MITSUBISHI ELECTRIC CORP32 citations93
US5868849AFeb 9, 1999
Surface processing device
MITSUBISHI ELECTRIC CORP22 citations93
US5863677AJan 26, 1999
Aligner and patterning method using phase shift mask
MITSUBISHI ELECTRIC CORP30 citations93
US5858625AJan 12, 1999
Phase shifting mask, manufacturing method thereof, and exposure method using such a phase shifting mask
MITSUBISHI ELECTRIC CORP26 citations93
US5698348ADec 16, 1997
Phase shifting mask, manufacturing method thereof, and exposure method using such a phase shifting mask
MITSUBISHI ELECTRIC CORP18 citations93
US5536602AJul 16, 1996
Phase shifting mask, manufacturing method thereof, and exposure method using such a phase shifting mask
MITSUBISHI ELECTRIC CORP28 citations93
US4806829AFeb 21, 1989
Apparatus utilizing charged particles
MITSUBISHI ELECTRIC CORP25 citations93
US5744268AApr 28, 1998
Phase shift mask, method of manufacturing a phase shift mask and method of forming a pattern with phase shift mask
MITSUBISHI ELECTRIC CORP19 citations84
US5902702AMay 11, 1999
Phase shift mask, blank for phase shift mask, and method of manufacturing phase shift mask
MITSUBISHI ELECTRIC CORP17 citations83
US5853922ADec 29, 1998
Phase shifting mask, manufacturing method thereof, and exposure method using such a phase shifting mask
MITSUBISHI ELECTRIC CORP16 citations82
US6605411B2Aug 12, 2003
Method for formation of semiconductor device pattern, method for designing photo mask pattern, photo mask and process for photo mask
MITSUBISHI ELECTRIC CORP5 citations74
US6329306B1Dec 11, 2001
Fine patterning utilizing an exposure method in photolithography
MITSUBISHI ELECTRIC CORP5 citations74
US6243159B1Jun 5, 2001
Projection aligner and exposure method using the same
MITSUBISHI ELECTRIC CORP8 citations74
US5994001ANov 30, 1999
Phase shift mask and its manufacturing method and semiconductor device and its manufacturing method using the phase shift mask
MITSUBISHI ELECTRIC CORP11 citations74
US5964989AOct 12, 1999
Ionized PVD device and method of manufacturing semiconductor device
MITSUBISHI ELECTRIC CORP11 citations74
US5825668AOct 20, 1998
Monitoring method and apparatus of surface area of semiconductor wafer
MITSUBISHI ELECTRIC CORP7 citations74
US4987092AJan 22, 1991
Process for manufacturing stacked semiconductor devices
MITSUBISHI ELECTRIC CORP16 citations74
US6449386B1Sep 10, 2002
Patterned figure resolution verification method and semiconductor pattern forming method
MITSUBISHI ELECTRIC CORP6 citations63
US6388731B1May 14, 2002
Projection aligner and exposure method using the same
MITSUBISHI ELECTRIC CORP4 citations63
US6162736ADec 19, 2000
Process for fabricating a semiconductor integrated circuit utilizing an exposure method
MITSUBISHI ELECTRIC CORP3 citations63
US5962172AOct 5, 1999
Method and apparatus for manufacturing photomask and method of manufacturing a semiconductor device
MITSUBISHI ELECTRIC CORP5 citations63
US5597667AJan 28, 1997
Photomask and photomask blank
MITSUBISHI ELECTRIC CORP3 citations63
US6042977AMar 28, 2000
Method and apparatus for manufacturing photomask and method of manufacturing a semiconductor device
MITSUBISHI ELECTRIC CORP0 citations52
US6426789B1Jul 30, 2002
Aligner having shared rotation shaft
MITSUBISHI ELECTRIC CORP0 citations42
RENESAS TECH CORP
11 patentsUS6709792B2Mar 23, 2004
Method for formation of semiconductor device pattern, method for designing photo mask pattern, photo mask and process for photo mask
RENESAS TECH CORP17 citations93
US6811939B2Nov 2, 2004
Focus monitoring method, focus monitoring system, and device fabricating method
RENESAS TECH CORP19 citations92
US6743554B2Jun 1, 2004
Photomask for aberration measurement, aberration measurement method unit for aberration measurement and manufacturing method for device
RENESAS TECH CORP14 citations84
US6797443B2Sep 28, 2004
Focus monitoring method, focus monitoring apparatus, and method of manufacturing semiconductor device
RENESAS TECH CORP13 citations83
US7459265B2Dec 2, 2008
Pattern forming method, semiconductor device manufacturing method and exposure mask set
RENESAS TECH CORP10 citations82
US6994940B2Feb 7, 2006
Phase shift mask, method for forming pattern using phase shift mask and manufacturing method for electronic device
RENESAS TECH CORP8 citations74
US6828080B2Dec 7, 2004
Pattern forming method and method of fabricating device
RENESAS TECH CORP9 citations74
US6764794B2Jul 20, 2004
Photomask for focus monitoring
RENESAS TECH CORP11 citations72
US6706453B2Mar 16, 2004
Method for formation of semiconductor device pattern, method for designing photo mask pattern, photo mask and process for photo mask
RENESAS TECH CORP2 citations63
US7670756B2Mar 2, 2010
Pattern forming method, semiconductor device manufacturing method and exposure mask set
RENESAS TECH CORP4 citations61
US6890692B2May 10, 2005
Method of focus monitoring and manufacturing method for an electronic device
RENESAS TECH CORP2 citations61
MINOLTA CO LTD
4 patentsUS5945982AAug 31, 1999
Data administration apparatus that can search for desired image data using maps
MINOLTA CO LTD143 citations97
US7209250B2Apr 24, 2007
Data processing apparatus, print-setting method, and recording medium
MINOLTA CO LTD31 citations93
US6369906B1Apr 9, 2002
Image reproduction apparatus and method for controlling image reproduction apparatus
MINOLTA CO LTD31 citations93
US7535585B2May 19, 2009
Computer program product executed in server computer connected to printer and client computer, and printer function description file editing method
MINOLTA CO LTD2 citations62