Inventor
HAUSMANN GILBERT
US19 patents
⚠️ This page may combine multiple inventors who share the name “HAUSMANN GILBERT”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
14 patentsUS6099697AAug 8, 2000
Method of and apparatus for restoring a support surface in a semiconductor wafer processing system
APPLIED MATERIALS INC313 citations99
US6743473B1Jun 1, 2004
Chemical vapor deposition of barriers from novel precursors
APPLIED MATERIALS INC400 citations98
US6475902B1Nov 5, 2002
Chemical vapor deposition of niobium barriers for copper metallization
APPLIED MATERIALS INC380 citations98
US5886866AMar 23, 1999
Electrostatic chuck having a combination electrode structure for substrate chucking, heating and biasing
APPLIED MATERIALS INC114 citations98
US6117246ASep 12, 2000
Conductive polymer pad for supporting a workpiece upon a workpiece support surface of an electrostatic chuck
APPLIED MATERIALS INC50 citations96
US6219219B1Apr 17, 2001
Cathode assembly containing an electrostatic chuck for retaining a wafer in a semiconductor wafer processing system
APPLIED MATERIALS INC63 citations93
US6057244AMay 2, 2000
Method for improved sputter etch processing
APPLIED MATERIALS INC68 citations93
US6215640B1Apr 10, 2001
Apparatus and method for actively controlling surface potential of an electrostatic chuck
APPLIED MATERIALS INC35 citations92
US6163448ADec 19, 2000
Apparatus and method for ex-situ testing of performance parameters on an electrostatic chuck
APPLIED MATERIALS INC21 citations92
US6104596AAug 15, 2000
Apparatus for retaining a subtrate in a semiconductor wafer processing system and a method of fabricating same
APPLIED MATERIALS INC50 citations92
US6067222AMay 23, 2000
Substrate support apparatus and method for fabricating same
APPLIED MATERIALS INC35 citations92
US5880923AMar 9, 1999
Method and apparatus for improved retention of a semiconductor wafer within a semiconductor wafer processing system
APPLIED MATERIALS INC47 citations92
US6547934B2Apr 15, 2003
Reduction of metal oxide in a dual frequency etch chamber
APPLIED MATERIALS INC9 citations74
US6908865B2Jun 21, 2005
Method and apparatus for cleaning substrates
APPLIED MATERIALS INC10 citations71
COVIDIEN LP
3 patentsUS8365730B2Feb 5, 2013
Method and system for classification of photo-plethysmographically detected respiratory effort
COVIDIEN LP25 citations92
US9044558B2Jun 2, 2015
Method and system for classification of photo-plethysmographically detected respiratory effort
COVIDIEN LP4 citations73
US10532170B2Jan 14, 2020
Method and system for classification of photo-plethysmographically detected respiratory effort
COVIDIEN LP0 citations52