P

Inventor

NAKAYAMA YOSHINORI

JP73 patents
⚠️ This page may combine multiple inventors who share the name “NAKAYAMA YOSHINORI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HITACHI LTD

26 patents
US6159644ADec 12, 2000

Method of fabricating semiconductor circuit devices utilizing multiple exposures

HITACHI LTD100 citations98
US6121625ASep 19, 2000

Charged particle beam lithography apparatus for forming pattern on semi-conductor

HITACHI LTD30 citations96
US5562800AOct 8, 1996

Wafer transport method

HITACHI LTD69 citations96
US5424173AJun 13, 1995

Electron beam lithography system and method

HITACHI LTD49 citations96
US5334282AAug 2, 1994

Electron beam lithography system and method

HITACHI LTD78 citations96
US5097138AMar 17, 1992

Electron beam lithography system and method

HITACHI LTD52 citations96
US5283440AFeb 1, 1994

Electron beam writing system used in a cell projection method

HITACHI LTD34 citations93
US6953938B2Oct 11, 2005

Deflector, method of manufacturing deflector, and charged particle beam exposure apparatus

HITACHI LTD35 citations92
US6511048B1Jan 28, 2003

Electron beam lithography apparatus and pattern forming method

HITACHI LTD20 citations92
US5650631AJul 22, 1997

Electron beam writing system

HITACHI LTD22 citations92
US5601686AFeb 11, 1997

Wafer transport method

HITACHI LTD26 citations92
US5396077AMar 7, 1995

Electron beam lithography apparatus having electron optics correction system

HITACHI LTD24 citations92
US5229607AJul 20, 1993

Combination apparatus having a scanning electron microscope therein

HITACHI LTD47 citations92
US5520297AMay 28, 1996

Aperture plate and a method of manufacturing the same

HITACHI LTD19 citations85
US6768118B2Jul 27, 2004

Electron beam monitoring sensor and electron beam monitoring method

HITACHI LTD8 citations74
US6441383B1Aug 27, 2002

Charged particle beam lithography apparatus for forming pattern on semi-conductor

HITACHI LTD6 citations74
US6320198B1Nov 20, 2001

Charged particle beam lithography apparatus for forming pattern on semi-conductor

HITACHI LTD4 citations74
US6262428B1Jul 17, 2001

Charged particle beam lithography apparatus for forming pattern on semi-conductor

HITACHI LTD6 citations74
US5974394AOct 26, 1999

Schedule retrieval method for controlling schedules and schedule server apparatus with multistageous idle-time retrieval means

HITACHI LTD10 citations74
US5831273ANov 3, 1998

Charged particle beam lithography method and apparatus thereof

HITACHI LTD16 citations74
US5468969ANov 21, 1995

Method and apparatus for electron beam lithography

HITACHI LTD13 citations74
US5334845AAug 2, 1994

Charged beam exposure method and apparatus as well as aperture stop and production method thereof

HITACHI LTD8 citations74
US4737973AApr 12, 1988

Crystal monochromator

HITACHI LTD15 citations74
US7276707B2Oct 2, 2007

Deflector, method of manufacturing deflector, and charged particle beam exposure apparatus

HITACHI LTD9 citations73
US6946662B2Sep 20, 2005

Multi-charged beam lens, charged-particle beam exposure apparatus using the same, and device manufacturing method

HITACHI LTD11 citations71
US6555833B2Apr 29, 2003

Charged particle beam lithography apparatus for forming pattern on semi-conductor

HITACHI LTD1 citations63

HITACHI HIGH TECH CORP

14 patents
US7326942B2Feb 5, 2008

Ion beam system and machining method

HITACHI HIGH TECH CORP24 citations93
US7078691B2Jul 18, 2006

Standard reference for metrology and calibration method of electron-beam metrology system using the same

HITACHI HIGH TECH CORP20 citations93
US7109494B2Sep 19, 2006

Deflector, method of manufacturing deflector, and charged particle beam exposure apparatus using deflector

HITACHI HIGH TECH CORP45 citations91
US7952083B2May 31, 2011

Ion beam system and machining method

HITACHI HIGH TECH CORP11 citations84
US7875850B2Jan 25, 2011

Standard component for calibration and electron-beam system using the same

HITACHI HIGH TECH CORP8 citations84
US7425714B2Sep 16, 2008

Measurement method of electron beam current, electron beam writing system and electron beam detector

HITACHI HIGH TECH CORP12 citations84
US7365306B2Apr 29, 2008

Standard member for length measurement, method for producing the same, and electron beam length measuring device using the same

HITACHI HIGH TECH CORP10 citations84
US6946665B2Sep 20, 2005

Charged particle beam exposure method and apparatus and device manufacturing method using the apparatus

HITACHI HIGH TECH CORP18 citations84
US8373113B2Feb 12, 2013

Calibration standard member, method for manufacturing the member and scanning electronic microscope using the member

HITACHI HIGH TECH CORP7 citations83
US7595482B2Sep 29, 2009

Standard component for length measurement, method for producing the same, and electron beam metrology system using the same

HITACHI HIGH TECH CORP7 citations74
US7423274B2Sep 9, 2008

Electron beam writing system and electron beam writing method

HITACHI HIGH TECH CORP7 citations73
US7947964B2May 24, 2011

Charged particle beam orbit corrector and charged particle beam apparatus

HITACHI HIGH TECH CORP6 citations63
US7834997B2Nov 16, 2010

Standard component for calibration and calibration method using it and electro beam system

HITACHI HIGH TECH CORP4 citations63
US7476882B2Jan 13, 2009

Calibration method for electron-beam system and electron-beam system

HITACHI HIGH TECH CORP4 citations63

CANON KK

4 patents

NAKAYAMA YOSHINORI

2 patents

SONY CORP

1 patent

NIPPON SOKEN

1 patent

SANYO ELECTRIC CO

1 patent

SUMITOMO CHEMICAL CO

1 patent

Showing the top 50 of 73 patents by PatentIndex Score.