Inventor
NAKAYAMA YOSHINORI
JP73 patents
⚠️ This page may combine multiple inventors who share the name “NAKAYAMA YOSHINORI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI LTD
26 patentsUS6159644ADec 12, 2000
Method of fabricating semiconductor circuit devices utilizing multiple exposures
HITACHI LTD100 citations98
US6121625ASep 19, 2000
Charged particle beam lithography apparatus for forming pattern on semi-conductor
HITACHI LTD30 citations96
US5562800AOct 8, 1996
Wafer transport method
HITACHI LTD69 citations96
US5424173AJun 13, 1995
Electron beam lithography system and method
HITACHI LTD49 citations96
US5334282AAug 2, 1994
Electron beam lithography system and method
HITACHI LTD78 citations96
US5097138AMar 17, 1992
Electron beam lithography system and method
HITACHI LTD52 citations96
US5283440AFeb 1, 1994
Electron beam writing system used in a cell projection method
HITACHI LTD34 citations93
US6953938B2Oct 11, 2005
Deflector, method of manufacturing deflector, and charged particle beam exposure apparatus
HITACHI LTD35 citations92
US6511048B1Jan 28, 2003
Electron beam lithography apparatus and pattern forming method
HITACHI LTD20 citations92
US5650631AJul 22, 1997
Electron beam writing system
HITACHI LTD22 citations92
US5601686AFeb 11, 1997
Wafer transport method
HITACHI LTD26 citations92
US5396077AMar 7, 1995
Electron beam lithography apparatus having electron optics correction system
HITACHI LTD24 citations92
US5229607AJul 20, 1993
Combination apparatus having a scanning electron microscope therein
HITACHI LTD47 citations92
US5520297AMay 28, 1996
Aperture plate and a method of manufacturing the same
HITACHI LTD19 citations85
US6768118B2Jul 27, 2004
Electron beam monitoring sensor and electron beam monitoring method
HITACHI LTD8 citations74
US6441383B1Aug 27, 2002
Charged particle beam lithography apparatus for forming pattern on semi-conductor
HITACHI LTD6 citations74
US6320198B1Nov 20, 2001
Charged particle beam lithography apparatus for forming pattern on semi-conductor
HITACHI LTD4 citations74
US6262428B1Jul 17, 2001
Charged particle beam lithography apparatus for forming pattern on semi-conductor
HITACHI LTD6 citations74
US5974394AOct 26, 1999
Schedule retrieval method for controlling schedules and schedule server apparatus with multistageous idle-time retrieval means
HITACHI LTD10 citations74
US5831273ANov 3, 1998
Charged particle beam lithography method and apparatus thereof
HITACHI LTD16 citations74
US5468969ANov 21, 1995
Method and apparatus for electron beam lithography
HITACHI LTD13 citations74
US5334845AAug 2, 1994
Charged beam exposure method and apparatus as well as aperture stop and production method thereof
HITACHI LTD8 citations74
US4737973AApr 12, 1988
Crystal monochromator
HITACHI LTD15 citations74
US7276707B2Oct 2, 2007
Deflector, method of manufacturing deflector, and charged particle beam exposure apparatus
HITACHI LTD9 citations73
US6946662B2Sep 20, 2005
Multi-charged beam lens, charged-particle beam exposure apparatus using the same, and device manufacturing method
HITACHI LTD11 citations71
US6555833B2Apr 29, 2003
Charged particle beam lithography apparatus for forming pattern on semi-conductor
HITACHI LTD1 citations63
HITACHI HIGH TECH CORP
14 patentsUS7326942B2Feb 5, 2008
Ion beam system and machining method
HITACHI HIGH TECH CORP24 citations93
US7078691B2Jul 18, 2006
Standard reference for metrology and calibration method of electron-beam metrology system using the same
HITACHI HIGH TECH CORP20 citations93
US7109494B2Sep 19, 2006
Deflector, method of manufacturing deflector, and charged particle beam exposure apparatus using deflector
HITACHI HIGH TECH CORP45 citations91
US7952083B2May 31, 2011
Ion beam system and machining method
HITACHI HIGH TECH CORP11 citations84
US7875850B2Jan 25, 2011
Standard component for calibration and electron-beam system using the same
HITACHI HIGH TECH CORP8 citations84
US7425714B2Sep 16, 2008
Measurement method of electron beam current, electron beam writing system and electron beam detector
HITACHI HIGH TECH CORP12 citations84
US7365306B2Apr 29, 2008
Standard member for length measurement, method for producing the same, and electron beam length measuring device using the same
HITACHI HIGH TECH CORP10 citations84
US6946665B2Sep 20, 2005
Charged particle beam exposure method and apparatus and device manufacturing method using the apparatus
HITACHI HIGH TECH CORP18 citations84
US8373113B2Feb 12, 2013
Calibration standard member, method for manufacturing the member and scanning electronic microscope using the member
HITACHI HIGH TECH CORP7 citations83
US7595482B2Sep 29, 2009
Standard component for length measurement, method for producing the same, and electron beam metrology system using the same
HITACHI HIGH TECH CORP7 citations74
US7423274B2Sep 9, 2008
Electron beam writing system and electron beam writing method
HITACHI HIGH TECH CORP7 citations73
US7947964B2May 24, 2011
Charged particle beam orbit corrector and charged particle beam apparatus
HITACHI HIGH TECH CORP6 citations63
US7834997B2Nov 16, 2010
Standard component for calibration and calibration method using it and electro beam system
HITACHI HIGH TECH CORP4 citations63
US7476882B2Jan 13, 2009
Calibration method for electron-beam system and electron-beam system
HITACHI HIGH TECH CORP4 citations63
CANON KK
4 patentsUS6818911B2Nov 16, 2004
Array structure and method of manufacturing the same, charged particle beam exposure apparatus, and device manufacturing method
CANON KK46 citations92
US7105842B2Sep 12, 2006
Method of charged particle beam lithography and equipment for charged particle beam lithography
CANON KK10 citations73
US7034321B2Apr 25, 2006
Electron beam exposure apparatus and electron beam measurement module
CANON KK9 citations73
US7098464B2Aug 29, 2006
Electron beam writing equipment and electron beam writing method
CANON KK5 citations63
NAKAYAMA YOSHINORI
2 patentsUS8735816B2May 27, 2014
Standard member for calibration and method of manufacturing the same and scanning electron microscope using the same
NAKAYAMA YOSHINORI4 citations70
US8263929B2Sep 11, 2012
Standard member for correction, scanning electron microscope using same, and scanning electron microscope correction method
NAKAYAMA YOSHINORI6 citations70
SONY CORP
1 patentNIPPON SOKEN
1 patentSANYO ELECTRIC CO
1 patentSUMITOMO CHEMICAL CO
1 patentShowing the top 50 of 73 patents by PatentIndex Score.