Inventor
IWASAWA HARUO
JP13 patents
Patents
13 patentsUS6908722B2Jun 21, 2005
Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition
JSR CORP200 citations98
US6531260B2Mar 11, 2003
Polysiloxane, method of manufacturing same, silicon-containing alicyclic compound, and radiation-sensitive resin composition
JSR CORP54 citations96
US6187504B1Feb 13, 2001
Radiation sensitive resin composition
JSR CORP69 citations96
US6180316B1Jan 30, 2001
Radiation sensitive resin composition
JSR CORP68 citations96
US7473443B2Jan 6, 2009
Composition for forming silicon film and method for forming silicon film
JSR CORP22 citations92
US7288359B2Oct 30, 2007
Radiation-sensitive resin composition
JSR CORP33 citations92
US7244549B2Jul 17, 2007
Pattern forming method and bilayer film
JSR CORP30 citations92
US7108955B2Sep 19, 2006
Polysiloxane, process for production thereof and radiation-sensitive resin composition
JSR CORP20 citations92
US6403280B1Jun 11, 2002
Radiation sensitive resin composition
JSR CORP46 citations91
US7223802B2May 29, 2007
High order silane composition, and method of forming silicon film using the composition
JSR CORP21 citations90
US6322949B2Nov 27, 2001
Radiation sensitive resin composition
JSR CORP13 citations73
US6846895B2Jan 25, 2005
Polysiloxane, method of manufacturing same, silicon-containing alicyclic compound, and radiation-sensitive resin composition
JSR CORP3 citations62
US7718228B2May 18, 2010
Composition for forming silicon-cobalt film, silicon-cobalt film and method for forming same
JSR CORP3 citations58