Inventor
IIDUKA YOSHIMASA
JP5 patents
Patents
5 patentsUS6507944B1Jan 14, 2003
Data processing method and apparatus, reticle mask, exposing method and apparatus, and recording medium
FUJITSU LTD18 citations92
US6444483B1Sep 3, 2002
Method and apparatus of producing partial-area mask data files
FUJITSU LTD9 citations71
US6635392B2Oct 21, 2003
Data processing apparatus, method and program product for compensating for photo proximity effect with reduced data amount, and photomask fabricated using same
FUJITSU LTD5 citations62
US6968531B2Nov 22, 2005
Exposure method utilizing optical proximity corrected exposure patterns, an apparatus for generating optical proximity corrected exposure data, and an exposure apparatus for optical proximity corrected exposure data
FUJITSU LTD5 citations60
US6807654B2Oct 19, 2004
Method of and device for detecting pattern, method of and device for checking pattern, method of and device for correcting and processing pattern, and computer product
FUJITSU LTD5 citations60