Inventor

STANTON WILLIAM A

US55 patents

⚠️ This page may combine multiple inventors who share the name “STANTON WILLIAM A”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

STANTON WILLIAM A

MICRON TECHNOLOGY INC

Method to eliminate side lobe printing of attenuated phase shift masks

Methods of forming radiation-patterning tools; carrier waves and computer readable media

Method to eliminate side lobe printing of attenuated phase shift masks

Reduction of contact size utilizing formation of spacer material over resist pattern

Methods and systems for controlling radiation beam characteristics for microlithographic processing

Optimized optical lithography illumination source for use during the manufacture of a semiconductor device

Methods and systems for controlling radiation beam characteristics for microlithographic processing

Microlithographic device, microlithographic assist features, system for forming contacts and other structures, and method of determining mask patterns

Method to eliminate side lobe printing of attenuated phase shift

Optical proximity correction methods, and methods of forming radiation-patterning tools

Optimized optical lithography illumination source for use during the manufacture of a semiconductor device

Method for improving a stepper signal in a planarized surface over alignment topography

Reticle design for alternating phase shift mask

Reticle design for alternating phase shift mask

Method for improving a stepper signal in a planarized surface over alignment topography

Method for improving a stepper signal in a planarized surface over alignment topography

Method for improving a stepper signal in a planarized surface over alignment topography

Methods and systems for controlling radiation beam characteristics for microlithographic processing

Methods of forming patterned reticles

Methods of forming patterned reticles

Methods of forming patterned reticles

Microlithographic structures and method of fabrication

Methods of forming patterned reticles

Writing methodology to reduce write time, and system for performing same

Method and system for lithographic simulation and verification

Methods of patterning photoresist, and methods of forming semiconductor constructions

Methods of forming radiation-patterning tools; carrier waves and computer readable media

Method and apparatus to increase throughput of processing using pulsed radiation sources

Masks for microlithography and methods of making and using such masks

Masks for microlithography and methods of making and using such masks

Masks for microlithography and methods of making and using such masks

Methods of forming patterned reticles

Methods of forming patterned reticles

Reticles and methods of forming and using the same

Optical proximity correction methods, and methods forming radiation-patterning tools

Reticles and methods of forming and using the same

Methods for defining evaluation points for optical proximity correction and optical proximity correction methods including same

Methods for generating or designing sidelobe inhibitors for radiation patterning tools

Methods of patterning photoresist, and methods of forming semiconductor constructions

Optimized optical lithography illumination source for use during the manufacture of a semiconductor device

Reticles and methods of forming and using the same

Methods of printing structures

Pattern mask with features to minimize the effect of aberrations

Methods of forming aligned structures with radiation-sensitive material

Radiation-patterning tool

APTINA IMAGING CORP

Guided-mode-resonance transmission color filters for color generation in CMOS image sensors

ROLLS ROYCE

Gas turbine engine casing

STANTON WILLIAM A

Photolithography systems and associated methods of selective die exposure

SYNOPSYS INC

Machine learning for selecting initial source shapes for source mask optimization

WANG FEI

Method and system for lithographic simulation and verification