Inventor

TOMIMORI HIROAKI

JP20 patents

⚠️ This page may combine multiple inventors who share the name “TOMIMORI HIROAKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOMIMORI HIROAKI

NEC ELECTRONICS CORP

Washing liquid composition for semiconductor substrate

Method of forming a semiconductor device by simultaneously cleaning both sides of a wafer using different cleaning solutions

Cleaning method, method for fabricating semiconductor device and cleaning solution

Semiconductor wafer surface and method of treating a semiconductor wafer surface

Method of washing a semiconductor wafer

Manufacturing method of semiconductor device

Semiconductor device having a roughened surface

Post-CMP washing liquid composition

Semiconductor device fabricating method and treating liquid

Removing solution, cleaning method for semiconductor substrate, and process for production of semiconductor device

Cleaning water for cleaning a wafer and method of cleaning a wafer

Process for making a semiconductor device having a roughened surface

Method of forming a high-k film on a semiconductor device

Removing solution, cleaning method for semiconductor substrate, and process for production of semiconductor device

Method for manufacturing semiconductor device to form a via hole

NEC CORP

Manufacturing method of semicondcutor device

Stripping agent composition and method of stripping

Method of forming a high-k film on a semiconductor device

KANTO KAGAKU

Cleaning solution for semiconductor substrate

SUMITOMO CHEMICAL CO

Anticorrosive treating concentrate