Inventor
BABCOCK CARL P
US22 patents
⚠️ This page may combine multiple inventors who share the name “BABCOCK CARL P”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ADVANCED MICRO DEVICES INC
21 patentsUS6335235B1Jan 1, 2002
Simplified method of patterning field dielectric regions in a semiconductor device
ADVANCED MICRO DEVICES INC145 citations98
US7207017B1Apr 17, 2007
Method and system for metrology recipe generation and review and analysis of design, simulation and metrology results
ADVANCED MICRO DEVICES INC85 citations97
US7281222B1Oct 9, 2007
System and method for automatic generation of optical proximity correction (OPC) rule sets
ADVANCED MICRO DEVICES INC38 citations92
US7269804B2Sep 11, 2007
System and method for integrated circuit device design and manufacture using optical rule checking to screen resolution enhancement techniques
ADVANCED MICRO DEVICES INC27 citations92
US6902851B1Jun 7, 2005
Method for using phase-shifting mask
ADVANCED MICRO DEVICES INC35 citations92
US6660459B2Dec 9, 2003
System and method for developing a photoresist layer with reduced pattern collapse
ADVANCED MICRO DEVICES INC21 citations92
US6630404B1Oct 7, 2003
Reducing feature dimension using self-assembled monolayer
ADVANCED MICRO DEVICES INC20 citations92
US6544699B1Apr 8, 2003
Method to improve accuracy of model-based optical proximity correction
ADVANCED MICRO DEVICES INC34 citations92
US6500587B1Dec 31, 2002
Binary and attenuating phase-shifting masks for multiple wavelengths
ADVANCED MICRO DEVICES INC27 citations92
US6475811B1Nov 5, 2002
System for and method of using bacteria to aid in contact hole printing
ADVANCED MICRO DEVICES INC22 citations92
US7422829B1Sep 9, 2008
Optical proximity correction (OPC) technique to compensate for flare
ADVANCED MICRO DEVICES INC12 citations84
US7125652B2Oct 24, 2006
Immersion lithographic process using a conforming immersion medium
ADVANCED MICRO DEVICES INC11 citations84
US6423555B1Jul 23, 2002
System for determining overlay error
ADVANCED MICRO DEVICES INC16 citations84
US6645868B1Nov 11, 2003
Method of forming shallow trench isolation using antireflection layer
ADVANCED MICRO DEVICES INC13 citations83
US6682988B1Jan 27, 2004
Growth of photoresist layer in photolithographic process
ADVANCED MICRO DEVICES INC11 citations74
US6576536B1Jun 10, 2003
Ultra narrow lines for field effect transistors
ADVANCED MICRO DEVICES INC10 citations74
US6255717B1Jul 3, 2001
Shallow trench isolation using antireflection layer
ADVANCED MICRO DEVICES INC13 citations73
US6906777B1Jun 14, 2005
Pellicle for a lithographic lens
ADVANCED MICRO DEVICES INC6 citations63
US6358843B1Mar 19, 2002
Method of making ultra small vias for integrated circuits
ADVANCED MICRO DEVICES INC4 citations63
US7061075B1Jun 13, 2006
Shallow trench isolation using antireflection layer
ADVANCED MICRO DEVICES INC6 citations62
US6821883B1Nov 23, 2004
Shallow trench isolation using antireflection layer
ADVANCED MICRO DEVICES INC5 citations62