P

Inventor

BABCOCK CARL P

US22 patents
⚠️ This page may combine multiple inventors who share the name “BABCOCK CARL P”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

ADVANCED MICRO DEVICES INC

21 patents
US6335235B1Jan 1, 2002

Simplified method of patterning field dielectric regions in a semiconductor device

ADVANCED MICRO DEVICES INC145 citations98
US7207017B1Apr 17, 2007

Method and system for metrology recipe generation and review and analysis of design, simulation and metrology results

ADVANCED MICRO DEVICES INC85 citations97
US7281222B1Oct 9, 2007

System and method for automatic generation of optical proximity correction (OPC) rule sets

ADVANCED MICRO DEVICES INC38 citations92
US7269804B2Sep 11, 2007

System and method for integrated circuit device design and manufacture using optical rule checking to screen resolution enhancement techniques

ADVANCED MICRO DEVICES INC27 citations92
US6902851B1Jun 7, 2005

Method for using phase-shifting mask

ADVANCED MICRO DEVICES INC35 citations92
US6660459B2Dec 9, 2003

System and method for developing a photoresist layer with reduced pattern collapse

ADVANCED MICRO DEVICES INC21 citations92
US6630404B1Oct 7, 2003

Reducing feature dimension using self-assembled monolayer

ADVANCED MICRO DEVICES INC20 citations92
US6544699B1Apr 8, 2003

Method to improve accuracy of model-based optical proximity correction

ADVANCED MICRO DEVICES INC34 citations92
US6500587B1Dec 31, 2002

Binary and attenuating phase-shifting masks for multiple wavelengths

ADVANCED MICRO DEVICES INC27 citations92
US6475811B1Nov 5, 2002

System for and method of using bacteria to aid in contact hole printing

ADVANCED MICRO DEVICES INC22 citations92
US7422829B1Sep 9, 2008

Optical proximity correction (OPC) technique to compensate for flare

ADVANCED MICRO DEVICES INC12 citations84
US7125652B2Oct 24, 2006

Immersion lithographic process using a conforming immersion medium

ADVANCED MICRO DEVICES INC11 citations84
US6423555B1Jul 23, 2002

System for determining overlay error

ADVANCED MICRO DEVICES INC16 citations84
US6645868B1Nov 11, 2003

Method of forming shallow trench isolation using antireflection layer

ADVANCED MICRO DEVICES INC13 citations83
US6682988B1Jan 27, 2004

Growth of photoresist layer in photolithographic process

ADVANCED MICRO DEVICES INC11 citations74
US6576536B1Jun 10, 2003

Ultra narrow lines for field effect transistors

ADVANCED MICRO DEVICES INC10 citations74
US6255717B1Jul 3, 2001

Shallow trench isolation using antireflection layer

ADVANCED MICRO DEVICES INC13 citations73
US6906777B1Jun 14, 2005

Pellicle for a lithographic lens

ADVANCED MICRO DEVICES INC6 citations63
US6358843B1Mar 19, 2002

Method of making ultra small vias for integrated circuits

ADVANCED MICRO DEVICES INC4 citations63
US7061075B1Jun 13, 2006

Shallow trench isolation using antireflection layer

ADVANCED MICRO DEVICES INC6 citations62
US6821883B1Nov 23, 2004

Shallow trench isolation using antireflection layer

ADVANCED MICRO DEVICES INC5 citations62

GLOBALFOUNDRIES INC

1 patent