Inventor

CHANG CHIH-HAO

TW166 patents

⚠️ This page may combine multiple inventors who share the name “CHANG CHIH-HAO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

CHANG CHIH-HAO

TAIWAN SEMICONDUCTOR MFG CO LTD

Method for fabricating a strained structure and structure formed

Semiconductor device with air gap on gate structure and method for forming the same

Integrated fan-out package and method of fabricating the same

Integrated circuit transistor structure with high germanium concentration SiGe stressor

Semiconductor device and forming method thereof

Gate spacer structure of FinFET device

FinFET device and method of forming same

Semiconductor device and manufacturing method thereof

Semiconductor device and manufacturing method thereof

Semiconductor package and forming method thereof

Structure and method for providing line end extensions for fin-type active regions

Package structure having redistribution layer structures

Method for fabricating semiconductor device including contact bars having narrower portions

Structure and method for providing line end extensions for fin-type active regions

Fin-like field effect transistor (FinFET) device and method of manufacturing same

Semiconductor device having a contact bar over an S/D structure

Integrated fan-out package

Structure and method for transistors with line end extension

Fin-like field effect transistor (FinFET) device and method of manufacturing same

Structure and method for providing line end extensions for fin-type active regions

Interconnect structures for wafer level package and methods of forming same

TAIWAN SEMICONDUCTOR MFG

Bottom-notched SiGe FinFET formation using condensation

Silicide formation and associated devices

Fin-like field effect transistor (FinFET) device and method of manufacturing same

Fin-like field effect transistor (FinFET) device and method of manufacturing same

Method for fabricating a strained structure

IO ESD device and methods for forming the same

Buried contact oxide etch with poly mask procedure

Semiconductor device with a buried stressor

CHANG CHIH-HAO

Method for forming high germanium concentration SiGe stressor

Bottom-notched SiGe FinFET formation using condensation

Hurdle

Illumination device

WANG YI-KAI

Foldable backlit display and device having the same

Electronic device having a flexible screen, a backlight module and a light guide plate

Display for electronic device

LEE TSUNG-LIN

Method for fabricating a strained structure

SUN SEY-PING

Semiconductor device having elevated structure and method of manufacturing the same

YU SHAO-MING

Structure and method for transistor with line end extension

WU ZHIQIANG

Semiconductor device with a buried stressor

KINPO ELECT INC

Slide cover unit

CHEN HUNG-MING

Silicide formation and associated devices

INNOLUX CORP

Touch display panel and driving method of touch mode

XU JEFF J

Fin-like field effect transistor (FinFET) device and method of manufacturing same

CHI YUN

Blue-emitting organometallic complexes and their application

LEE TUNG YING

IO ESD device and methods for forming the same

SILICONWARE PRECISION INDUSTRIES CO LTD

Circuit board with quality-indicator mark and method for indicating quality of the circuit board

QUANTA COMP INC

Method and system for compensating for temperature rise effects

LITE ON ELECTRONICS GUANGZHOU LTD

Single-phase three-wire power control system and power control method therefor

WANN CLEMENT HSINGJEN

Semiconductor device and method of forming the same