Inventor
GOTO HARUHIRO HARRY
US17 patents
⚠️ This page may combine multiple inventors who share the name “GOTO HARUHIRO HARRY”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
NOVELLUS SYSTEMS INC
5 patentsUS7288484B1Oct 30, 2007
Photoresist strip method for low-k dielectrics
NOVELLUS SYSTEMS INC53 citations94
US7585777B1Sep 8, 2009
Photoresist strip method for low-k dielectrics
NOVELLUS SYSTEMS INC25 citations90
US7202176B1Apr 10, 2007
Enhanced stripping of low-k films using downstream gas mixing
NOVELLUS SYSTEMS INC48 citations89
US9373497B2Jun 21, 2016
Methods for stripping photoresist and/or cleaning metal regions
NOVELLUS SYSTEMS INC3 citations68
US9941108B2Apr 10, 2018
High dose implantation strip (HDIS) in H2 base chemistry
NOVELLUS SYSTEMS INC1 citations63
GOTO HARUHIRO HARRY
4 patentsUS8193096B2Jun 5, 2012
High dose implantation strip (HDIS) in H2 base chemistry
GOTO HARUHIRO HARRY16 citations92
US8058178B1Nov 15, 2011
Photoresist strip method for low-k dielectrics
GOTO HARUHIRO HARRY22 citations90
US8641862B2Feb 4, 2014
High dose implantation strip (HDIS) in H2 base chemistry
GOTO HARUHIRO HARRY8 citations83
US8444869B1May 21, 2013
Simultaneous front side ash and backside clean
GOTO HARUHIRO HARRY11 citations83
APPLIED KOMATSU TECHNOLOGY INC
4 patentsUS5895937AApr 20, 1999
Tapered dielectric etch in semiconductor devices
APPLIED KOMATSU TECHNOLOGY INC52 citations92
US5843277ADec 1, 1998
Dry-etch of indium and tin oxides with C2H5I gas
APPLIED KOMATSU TECHNOLOGY INC30 citations92
US5728608AMar 17, 1998
Tapered dielectric etch in semiconductor devices
APPLIED KOMATSU TECHNOLOGY INC11 citations70
US6472329B1Oct 29, 2002
Etching aluminum over refractory metal with successive plasmas
APPLIED KOMATSU TECHNOLOGY INC12 citations68