Inventor
HIRSCHER STEFAN
DE2 patents
Patents
2 patentsUS7376512B2May 20, 2008
Method for determining an optimal absorber stack geometry of a lithographic reflection mask
INFINEON TECHNOLOGIES AG13 citations79
US7094507B2Aug 22, 2006
Method for determining an optimal absorber stack geometry of a lithographic reflection mask
INFINEON TECHNOLOGIES AG9 citations69