Inventor

NAKAGAWA YUKITO

JP18 patents

⚠️ This page may combine multiple inventors who share the name “NAKAGAWA YUKITO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

NAKAGAWA YUKITO

CANON ANELVA CORP

Substrate processing apparatus, etching method of metal film, and manufacturing method of magnetoresistive effect element

Method for manufacturing semiconductor device, ion beam etching device, and control device

Method of fabricating fin FET and method of fabricating device

Grid, method of manufacturing the same, and ion beam processing apparatus

Process for producing magnetoresistive effect element

Method for manufacturing semiconductor device, ion beam etching device, and control device

Surface processing apparatus

ANELVA CORP

Plasma processing system for sputter deposition applications

Plasma processing apparatus

Apparatus for processing an object by gas plasma with a reduced damage

Plasma processing system

Surface processing apparatus

NEC CORP

Plasma processing apparatus

Plasma processing apparatus for producing plasma at low electron temperatures

Plasma generator with a shield interposing the antenna

Plasma processing apparatus which uses a uniquely shaped antenna to reduce the overall size of the apparatus with respect to the plasma chamber

IORI KAZUYUKI

Plasma processing device, plasma processing method and method of manufacturing element including substrate to be processed

SATO NORIYOSHI

Plasma processing system