Inventor
MINAMIDE AYUMI
JP11 patents
⚠️ This page may combine multiple inventors who share the name “MINAMIDE AYUMI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MITSUBISHI ELECTRIC CORP
7 patentsUS6579657B1Jun 17, 2003
Material for forming a fine pattern and method for manufacturing a semiconductor device using the same
MITSUBISHI ELECTRIC CORP169 citations98
US5858620AJan 12, 1999
Semiconductor device and method for manufacturing the same
MITSUBISHI ELECTRIC CORP267 citations98
US6323560B1Nov 27, 2001
Registration accuracy measurement mark, method of repairing defect of the mark, photomask having the mark, method of manufacturing the photo mask and method of exposure thereof
MITSUBISHI ELECTRIC CORP63 citations95
US5892291AApr 6, 1999
Registration accuracy measurement mark
MITSUBISHI ELECTRIC CORP15 citations81
US6171761B1Jan 9, 2001
Resist pattern forming method utilizing multiple baking and partial development steps
MITSUBISHI ELECTRIC CORP13 citations73
US6068952AMay 30, 2000
Registration accuracy measurement mark, method of repairing defect of the mark, photomask having the mark, method of manufacturing the photomask and method of exposure thereof
MITSUBISHI ELECTRIC CORP4 citations73
US12352674B2Jul 8, 2025
Test method and method for manufacturing semiconductor device
MITSUBISHI ELECTRIC CORP0 citations46
MINAMIDE AYUMI
3 patentsUS8563200B2Oct 22, 2013
Manufacturing method of photomask, method for optical proximity correction, and manufacturing method of semiconductor device
MINAMIDE AYUMI0 citations48
US8119308B2Feb 21, 2012
Photomask, apparatus for manufacturing semiconductor device having the photomask, and method of manufacturing semiconductor device using the photomask
MINAMIDE AYUMI1 citations47
US8426087B2Apr 23, 2013
Photomask, manufacturing apparatus and method of semiconductor device using the same, and photomask feature layout method
MINAMIDE AYUMI0 citations35