Inventor
MONIWA AKEMI
JP13 patents
⚠️ This page may combine multiple inventors who share the name “MONIWA AKEMI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI LTD
4 patentsUS6964832B2Nov 15, 2005
Semiconductor device and manufacturing method thereof
HITACHI LTD61 citations96
US5895741AApr 20, 1999
Photomask, manufacture of photomask, formation of pattern, manufacture of semiconductor device, and mask pattern design system
HITACHI LTD59 citations96
US5700601ADec 23, 1997
Photomask, manufacture of photomask, formation of pattern, manufacture of semiconductor device, and mask pattern design system
HITACHI LTD40 citations92
US6586341B2Jul 1, 2003
Method of manufacturing semiconductor device
HITACHI LTD16 citations84
RENESAS ELECTRONICS CORP
3 patentsUS8835083B2Sep 16, 2014
Manufacturing method of photomask, method for optical proximity correction, and manufacturing method of semiconductor device
RENESAS ELECTRONICS CORP0 citations51
US8367309B2Feb 5, 2013
Pattern formation method using levenson-type mask and method of manufacturing levenson-type mask
RENESAS ELECTRONICS CORP0 citations48
US7935462B2May 3, 2011
Pattern formation method using levenson-type mask and method of manufacturing levenson-type mask
RENESAS ELECTRONICS CORP0 citations48
MINAMIDE AYUMI
3 patentsUS8563200B2Oct 22, 2013
Manufacturing method of photomask, method for optical proximity correction, and manufacturing method of semiconductor device
MINAMIDE AYUMI0 citations48
US8119308B2Feb 21, 2012
Photomask, apparatus for manufacturing semiconductor device having the photomask, and method of manufacturing semiconductor device using the photomask
MINAMIDE AYUMI1 citations47
US8426087B2Apr 23, 2013
Photomask, manufacturing apparatus and method of semiconductor device using the same, and photomask feature layout method
MINAMIDE AYUMI0 citations35