P

Inventor

MUTCH MICHAEL

US15 patents

Patents

15 patents
US11170834B2Nov 9, 2021

Memory cells and methods of forming a capacitor including current leakage paths having different total resistances

MICRON TECHNOLOGY INC9 citations83
US10886130B2Jan 5, 2021

Methods of forming crystalline semiconductor material, and methods of forming transistors

MICRON TECHNOLOGY INC2 citations69
US12057472B2Aug 6, 2024

Devices comprising crystalline materials

MICRON TECHNOLOGY INC0 citations62
US11735416B2Aug 22, 2023

Electronic devices comprising crystalline materials and related memory devices and systems

MICRON TECHNOLOGY INC0 citations62
US11532699B2Dec 20, 2022

Devices comprising crystalline materials and related systems

MICRON TECHNOLOGY INC0 citations62
US12191354B2Jan 7, 2025

Vertical transistors having at least 50% grain boundaries offset between top and bottom source/drain regions and the channel region that is vertically therebetween

MICRON TECHNOLOGY INC0 citations61
US11728387B2Aug 15, 2023

Semiconductor devices comprising continuous crystalline structures, and related memory devices and systems

MICRON TECHNOLOGY INC0 citations61
US11695071B2Jul 4, 2023

Transistor and methods of forming transistors

MICRON TECHNOLOGY INC0 citations61
US11417730B2Aug 16, 2022

Vertical transistors with channel region having vertically elongated crystal grains that individually are directly against both of the top and bottom source/drain regions

MICRON TECHNOLOGY INC0 citations61
US11018229B2May 25, 2021

Methods of forming semiconductor structures

MICRON TECHNOLOGY INC0 citations61
US10964811B2Mar 30, 2021

Transistor and methods of forming transistors

MICRON TECHNOLOGY INC0 citations61
US11935574B2Mar 19, 2024

Memory cells and methods of forming a capacitor including current leakage paths having different total resistances

MICRON TECHNOLOGY INC0 citations60
US10790145B2Sep 29, 2020

Methods of forming crystallized materials from amorphous materials

MICRON TECHNOLOGY INC0 citations51
US10707298B2Jul 7, 2020

Methods of forming semiconductor structures

MICRON TECHNOLOGY INC0 citations51
US11587938B2Feb 21, 2023

Methods of incorporating leaker devices into capacitor configurations to reduce cell disturb, and capacitor configurations incorporating leaker devices

MICRON TECHNOLOGY INC0 citations49