Inventor

SHIBAGAKI MASAMI

JP20 patents

⚠️ This page may combine multiple inventors who share the name “SHIBAGAKI MASAMI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SHIBAGAKI MASAMI

CANON ANELVA CORP

Substrate supporting/transferring tray

Substrate heat treatment apparatus and substrate transfer tray used in substrate heat treatment

Substrate heating apparatus and semiconductor fabrication method

Heat treatment method and heat treatment apparatus for semiconductor substrate

Substrate heat treatment apparatus

Heating apparatus, heating method, and semiconductor device manufacturing method

Etching apparatus

SHIBAGAKI MASAMI

Substrate supporting/transferring tray

Annealing method for semiconductor device with silicon carbide substrate and semiconductor device

Substrate processing method and method of manufacturing crystalline silicon carbide (SIC) substrate

Apparatus for heat-treating substrate and method for heat-treating substrate

Temperature control method for substrate heat treatment apparatus, semiconductor device manufacturing method, temperature control program for substrate heat treatment apparatus, and recording medium

Substrate heat treating apparatus, temperature control method of substrate heat treating apparatus, manufacturing method of semiconductor device, temperature control program of substrate heat treating apparatus, and recording medium

ANELVA CORP

Etching method

Method for forming a copper thin film

MASAKI NOBUYUKI

Vacuum heating apparatus

Substrate processing apparatus, substrate annealing method, and semiconductor device manufacturing method

KUMAGAI AKIRA

Heating process apparatus

CANON ANELVA ENGINEERING CORP

Substrate heating apparatus, heating method, and semiconductor device manufacturing method

DOI HIROSHI

Heat treatment apparatus and semiconductor device manufacturing method