Inventor
YAN QILIANG
US21 patents
⚠️ This page may combine multiple inventors who share the name “YAN QILIANG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SYNOPSYS INC
19 patentsUS8918743B1Dec 23, 2014
Edge-based full chip mask topography modeling
SYNOPSYS INC38 citations91
US9348964B2May 24, 2016
MASK3D model accuracy enhancement for small feature coupling effect
SYNOPSYS INC9 citations84
US7496880B2Feb 24, 2009
Method and apparatus for assessing the quality of a process model
SYNOPSYS INC10 citations84
US10635776B1Apr 28, 2020
Producing mask layouts with rounded corners
SYNOPSYS INC8 citations83
US7243332B2Jul 10, 2007
Method and apparatus for identifying a manufacturing problem area in a layout using a gradient-magnitude of a process-sensitivity model
SYNOPSYS INC10 citations83
US7954071B2May 31, 2011
Assist feature placement based on a focus-sensitive cost-covariance field
SYNOPSYS INC12 citations81
US8972229B2Mar 3, 2015
Fast 3D mask model based on implicit countors
SYNOPSYS INC9 citations80
US7721246B2May 18, 2010
Method and apparatus for quickly determining the effect of placing an assist feature at a location in a layout
SYNOPSYS INC11 citations80
US7784018B2Aug 24, 2010
Method and apparatus for identifying a manufacturing problem area in a layout using a gradient-magnitude of a process-sensitivity model
SYNOPSYS INC4 citations73
US8719736B1May 6, 2014
Compact and accurate wafer topography proximity effect modeling for full chip simulation
SYNOPSYS INC5 citations66
US7933471B2Apr 26, 2011
Method and system for correlating physical model representation to pattern layout
SYNOPSYS INC3 citations62
US7320119B2Jan 15, 2008
Method and apparatus for identifying a problem edge in a mask layout using an edge-detecting process-sensitivity model
SYNOPSYS INC3 citations62
US11314171B2Apr 26, 2022
Lithography improvement based on defect probability distributions and critical dimension variations
SYNOPSYS INC0 citations59
US7788630B2Aug 31, 2010
Method and apparatus for determining an optical model that models the effect of optical proximity correction
SYNOPSYS INC5 citations56
US7681172B2Mar 16, 2010
Method and apparatus for modeling an apodization effect in an optical lithography system
SYNOPSYS INC5 citations54
US10691015B2Jun 23, 2020
Integrated mask-aware lithography modeling to support off-axis illumination and multi-tone masks
SYNOPSYS INC0 citations52
US9354511B2May 31, 2016
Integrated mask-aware lithography modeling to support off-axis illumination and multi-tone masks
SYNOPSYS INC0 citations52
US7739645B2Jun 15, 2010
Method and apparatus for determining a process model using a 2-D-pattern detecting kernel
SYNOPSYS INC0 citations51
US7308673B2Dec 11, 2007
Method and apparatus for correcting 3D mask effects
SYNOPSYS INC1 citations51