Inventor
TADA MITSUO
JP20 patents
⚠️ This page may combine multiple inventors who share the name “TADA MITSUO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
EBARA CORP
17 patentsUS6517689B1Feb 11, 2003
Plating device
EBARA CORP57 citations95
US7670206B2Mar 2, 2010
Substrate polishing apparatus and substrate polishing method
EBARA CORP27 citations92
US7508201B2Mar 24, 2009
Eddy current sensor
EBARA CORP22 citations92
US6746319B2Jun 8, 2004
Measuring apparatus
EBARA CORP21 citations92
US7714572B2May 11, 2010
Method of detecting characteristics of films using eddy current
EBARA CORP14 citations91
US7078894B2Jul 18, 2006
Polishing device using eddy current sensor
EBARA CORP17 citations91
US7046001B2May 16, 2006
Frequency measuring device, polishing device using the same and eddy current sensor
EBARA CORP36 citations91
US7854646B2Dec 21, 2010
Substrate polishing apparatus and substrate polishing method
EBARA CORP12 citations84
US7258595B2Aug 21, 2007
Polishing apparatus
EBARA CORP8 citations74
US9632061B2Apr 25, 2017
Eddy current sensor and polishing method
EBARA CORP6 citations73
US10933507B2Mar 2, 2021
Polishing apparatus
EBARA CORP2 citations72
US9437507B2Sep 6, 2016
Method of correcting film thickness measurement value, film thickness corrector and eddy current sensor
EBARA CORP3 citations72
US6500317B1Dec 31, 2002
Plating apparatus for detecting the conductivity between plating contacts on a substrate
EBARA CORP8 citations72
US10134614B2Nov 20, 2018
Substrate peripheral portion measuring device, and substrate peripheral portion polishing apparatus
EBARA CORP2 citations69
US10739488B2Aug 11, 2020
Metal detection sensor and metal detection method using same
EBARA CORP1 citations62
US7960188B2Jun 14, 2011
Polishing method
EBARA CORP3 citations62
US6935935B2Aug 30, 2005
Measuring apparatus
EBARA CORP2 citations62