Inventor
IIZUKA OSAMU
JP21 patents
⚠️ This page may combine multiple inventors who share the name “IIZUKA OSAMU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
NUFLARE TECHNOLOGY INC
18 patentsUS8362450B2Jan 29, 2013
Electron beam drift correction method and electron beam writing method
NUFLARE TECHNOLOGY INC9 citations83
US10867774B2Dec 15, 2020
Multi charged particle beam writing apparatus and multi charged particle beam writing method
NUFLARE TECHNOLOGY INC2 citations72
US10109458B2Oct 23, 2018
Multi charged-particle beam writing apparatus and adjustment method for the same
NUFLARE TECHNOLOGY INC3 citations72
US9966228B2May 8, 2018
Multi charged particle beam apparatus, and shape adjustment method of multi charged particle beam image
NUFLARE TECHNOLOGY INC3 citations72
US9466461B2Oct 11, 2016
Rotation angle measuring method of multi-charged particle beam image, rotation angle adjustment method of multi-charged particle beam image, and multi-charged particle beam writing apparatus
NUFLARE TECHNOLOGY INC3 citations71
US10388488B2Aug 20, 2019
Multi charged particle beam drawing apparatus and multi charged particle beam drawing method
NUFLARE TECHNOLOGY INC2 citations70
US10504696B2Dec 10, 2019
Multi charged particle beam writing apparatus and multi charged particle beam writing method
NUFLARE TECHNOLOGY INC1 citations61
US10483088B2Nov 19, 2019
Multi charged particle beam writing apparatus and multi charged particle beam writing method
NUFLARE TECHNOLOGY INC1 citations61
US11024485B2Jun 1, 2021
Multi-charged-particle-beam writing apparatus and beam evaluating method for the same
NUFLARE TECHNOLOGY INC1 citations54
US11127566B2Sep 21, 2021
Multi charged particle beam writing apparatus and multi charged particle beam writing method
NUFLARE TECHNOLOGY INC0 citations51
US9653262B2May 16, 2017
Method of measuring beam position of multi charged particle beam, and multi charged particle beam writing apparatus
NUFLARE TECHNOLOGY INC1 citations51
US9536705B2Jan 3, 2017
Method for correcting drift of charged particle beam, and charged particle beam writing apparatus
NUFLARE TECHNOLOGY INC0 citations51
US8008631B2Aug 30, 2011
Method of acquiring offset deflection amount for shaped beam and lithography apparatus
NUFLARE TECHNOLOGY INC1 citations49
US11037759B2Jun 15, 2021
Multi charged particle beam writing apparatus and multi charged particle beam writing method
NUFLARE TECHNOLOGY INC0 citations46
US9236154B2Jan 12, 2016
Charged-particle beam drawing method, computer-readable recording media, and charged-particle beam drawing apparatus
NUFLARE TECHNOLOGY INC1 citations45
US10636616B2Apr 28, 2020
Aperture array alignment method and multi charged particle beam writing apparatus
NUFLARE TECHNOLOGY INC0 citations40
US10497539B2Dec 3, 2019
Multi charged particle beam writing apparatus and multi charged particle beam writing method
NUFLARE TECHNOLOGY INC0 citations40
US9460892B2Oct 4, 2016
Charged particle beam writing method, computer-readable recording medium, and charged particle beam writing apparatus
NUFLARE TECHNOLOGY INC0 citations35