P

Inventor

YONEDA IKUO

JP43 patents
⚠️ This page may combine multiple inventors who share the name “YONEDA IKUO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOSHIBA KK

18 patents
US5792376AAug 11, 1998

Plasma processing apparatus and plasma processing method

TOSHIBA KK191 citations99
US7390365B2Jun 24, 2008

Developing method, substrate treating method, and substrate treating apparatus

TOSHIBA KK27 citations93
US7094522B2Aug 22, 2006

Developing method, substrate treating method, and substrate treating apparatus

TOSHIBA KK14 citations93
US6929903B2Aug 16, 2005

Developing method, substrate treating method, and substrate treating apparatus

TOSHIBA KK21 citations93
US6165907ADec 26, 2000

Plasma etching method and plasma etching apparatus

TOSHIBA KK20 citations92
US9381540B2Jul 5, 2016

Pattern forming method

TOSHIBA KK6 citations84
US7856288B2Dec 21, 2010

Imprint system and imprint method

TOSHIBA KK8 citations83
US7001086B2Feb 21, 2006

Developing method, substrate treating method, and substrate treating apparatus

TOSHIBA KK9 citations74
US6159642ADec 12, 2000

Exposure mask and method of manufacturing thereof, and pattern data generating method for an exposure mask

TOSHIBA KK15 citations74
US8019462B2Sep 13, 2011

Imprint system and imprint method

TOSHIBA KK6 citations73
US7854604B2Dec 21, 2010

Semiconductor device fabrication method and pattern formation mold

TOSHIBA KK5 citations73
US9377777B2Jun 28, 2016

Fine processing method, fine processing apparatus, and recording medium with fine processing program recorded thereon

TOSHIBA KK3 citations72
US9403316B2Aug 2, 2016

Pattern forming method and pattern forming apparatus

TOSHIBA KK0 citations52
US9588418B2Mar 7, 2017

Pattern forming method

TOSHIBA KK0 citations51
US9550322B2Jan 24, 2017

Near-field exposure mask, resist pattern forming method, device manufacturing method, near-field exposure method, pattern forming method, near-field optical lithography member, and near-field nanoimprint method

TOSHIBA KK0 citations51
USRE46191ENov 1, 2016

Imprint pattern forming method

TOSHIBA KK0 citations51
US8945798B2Feb 3, 2015

Near-field exposure mask and pattern forming method

TOSHIBA KK0 citations51
US7368735B2May 6, 2008

Charged beam drawing data creation method, charged beam drawing method, charged beam drawing apparatus and semiconductor device manufacturing method

TOSHIBA KK0 citations42

YONEDA IKUO

6 patents
US8419995B2Apr 16, 2013

Imprint method

YONEDA IKUO19 citations83
US8227267B2Jul 24, 2012

Template inspection method and manufacturing method for semiconductor device

YONEDA IKUO7 citations83
US8202463B2Jun 19, 2012

Imprint method

YONEDA IKUO13 citations83
US8946080B2Feb 3, 2015

Pattern transfer method

YONEDA IKUO2 citations62
US8282868B2Oct 9, 2012

Semiconductor device fabrication method and pattern formation mold

YONEDA IKUO1 citations51
US8206895B2Jun 26, 2012

Method for forming pattern and method for manufacturing semiconductor device

YONEDA IKUO0 citations51

TOSHIBA MEMORY CORP

6 patents
US10192741B2Jan 29, 2019

Device substrate, method of manufacturing device substrate, and method of manufacturing semiconductor device

TOSHIBA MEMORY CORP3 citations72
US9793120B2Oct 17, 2017

Device substrate, method of manufacturing device substrate, and method of manufacturing semiconductor device

TOSHIBA MEMORY CORP2 citations72
US10241397B2Mar 26, 2019

Imprint apparatus and imprint method

TOSHIBA MEMORY CORP1 citations62
US9944014B2Apr 17, 2018

Pattern forming method and pattern forming apparatus

TOSHIBA MEMORY CORP0 citations52
USRE47093EOct 23, 2018

Imprint pattern forming method

TOSHIBA MEMORY CORP0 citations51
US10018908B2Jul 10, 2018

Pattern forming method

TOSHIBA MEMORY CORP0 citations51

MIKAMI SHINJI

2 patents
US8480946B2Jul 9, 2013

Imprint method and template for imprinting

MIKAMI SHINJI12 citations82
US8485624B2Jul 16, 2013

Droplet dispensing control method, droplet dispensing control device, and method of manufacturing semiconductor devices

MIKAMI SHINJI4 citations61

TOKUE HIROSHI

2 patents
US8444889B2May 21, 2013

Imprint pattern forming method

TOKUE HIROSHI7 citations81
US8221827B2Jul 17, 2012

Patterning method

TOKUE HIROSHI1 citations49

CANON KK

2 patents
US10168615B2Jan 1, 2019

Imprint apparatus, imprint method, and article manufacturing method

CANON KK5 citations73
US11333969B2May 17, 2022

Imprint apparatus, imprint method, and article manufacturing method

CANON KK0 citations52

KIOXIA CORP

2 patents
USRE48815ENov 9, 2021

Method of designing a template pattern, method of manufacturing a template and method of manufacturing a semiconductor device

KIOXIA CORP0 citations61
US11282723B2Mar 22, 2022

Liquid delivery member, liquid delivery apparatus, and semiconductor device manufacturing method

KIOXIA CORP0 citations49

INANAMI RYOICHI

1 patent
US8468480B2Jun 18, 2013

Method of designing a template pattern, method of manufacturing a template and method of manufacturing a semiconductor device

INANAMI RYOICHI8 citations82

NAKAGAWA YASUTADA

1 patent
US8691123B2Apr 8, 2014

Fine processing method, fine processing apparatus, and recording medium with fine processing program recorded thereon

NAKAGAWA YASUTADA6 citations78

HATANO MASAYUKI

1 patent
US8973494B2Mar 10, 2015

Imprint method and imprint apparatus

HATANO MASAYUKI2 citations61

KOSHIBA TAKESHI

1 patent
US9046763B2Jun 2, 2015

Pattern forming method

KOSHIBA TAKESHI3 citations60

SHIDA NAOMI

1 patent
US9029047B2May 12, 2015

Near-field exposure mask, resist pattern forming method, device manufacturing method, near-field exposure method, pattern forming method, near-field optical lithography member, and near-field nanoimprint method

SHIDA NAOMI0 citations45