Inventor
PENG DANPING
US35 patents
⚠️ This page may combine multiple inventors who share the name “PENG DANPING”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
20 patentsUS10671786B2Jun 2, 2020
Method of modeling a mask by taking into account of mask pattern edge interaction
TAIWAN SEMICONDUCTOR MFG CO LTD7 citations83
US10466586B2Nov 5, 2019
Method of modeling a mask having patterns with arbitrary angles
TAIWAN SEMICONDUCTOR MFG CO LTD5 citations83
US10671052B2Jun 2, 2020
Synchronized parallel tile computation for large area lithography simulation
TAIWAN SEMICONDUCTOR MFG CO LTD5 citations79
US10990002B2Apr 27, 2021
Sub-resolution assist features
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US11754930B2Sep 12, 2023
Multi-component kernels for vector optical image simulation
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations72
US11435670B1Sep 6, 2022
Multi-component kernels for vector optical image simulation
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations72
US11143955B2Oct 12, 2021
Method of modeling a mask having patterns with arbitrary angles
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US10838305B2Nov 17, 2020
Lithographic mask correction using volume correction techniques
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations72
US11340584B2May 24, 2022
Synchronized parallel tile computation for large area lithography simulation
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations70
US10915090B2Feb 9, 2021
Synchronized parallel tile computation for large area lithography simulation
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations70
US12416857B2Sep 16, 2025
Sub-resolution assist features
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12153349B2Nov 26, 2024
Multi-component kernels for vector optical image simulation
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11994796B2May 28, 2024
Method of modeling a mask having patterns with arbitrary angles
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11829066B2Nov 28, 2023
Sub-resolution assist features
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11645443B2May 9, 2023
Method of modeling a mask by taking into account of mask pattern edge interaction
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12112116B2Oct 8, 2024
Machine learning based model builder and its applications for pattern transferring in semiconductor manufacturing
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US12056431B2Aug 6, 2024
Methods of preparing photo mask data and manufacturing a photo mask
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations61
US11610043B2Mar 21, 2023
Machine learning based model builder and its applications for pattern transferring in semiconductor manufacturing
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations61
US11531273B2Dec 20, 2022
Lithographic mask correction using volume correction techniques
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US11747786B2Sep 5, 2023
Synchronized parallel tile computation for large area lithography simulation
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations59
LUMINESCENT TECHNOLOGIES INC
14 patentsUS7124394B1Oct 17, 2006
Method for time-evolving rectilinear contours representing photo masks
LUMINESCENT TECHNOLOGIES INC69 citations98
US7707541B2Apr 27, 2010
Systems, masks, and methods for photolithography
LUMINESCENT TECHNOLOGIES INC61 citations97
US7571423B2Aug 4, 2009
Optimized photomasks for photolithography
LUMINESCENT TECHNOLOGIES INC51 citations97
US7480889B2Jan 20, 2009
Optimized photomasks for photolithography
LUMINESCENT TECHNOLOGIES INC59 citations97
US8056021B2Nov 8, 2011
Method for time-evolving rectilinear contours representing photo masks
LUMINESCENT TECHNOLOGIES INC31 citations96
US7992109B2Aug 2, 2011
Method for time-evolving rectilinear contours representing photo masks
LUMINESCENT TECHNOLOGIES INC29 citations96
US7984391B2Jul 19, 2011
Method for time-evolving rectilinear contours representing photo masks
LUMINESCENT TECHNOLOGIES INC29 citations96
US7757201B2Jul 13, 2010
Method for time-evolving rectilinear contours representing photo masks
LUMINESCENT TECHNOLOGIES INC40 citations96
US7703068B2Apr 20, 2010
Technique for determining a mask pattern corresponding to a photo-mask
LUMINESCENT TECHNOLOGIES INC36 citations96
US7441227B2Oct 21, 2008
Method for time-evolving rectilinear contours representing photo masks
LUMINESCENT TECHNOLOGIES INC49 citations96
US7178127B2Feb 13, 2007
Method for time-evolving rectilinear contours representing photo masks
LUMINESCENT TECHNOLOGIES INC58 citations96
US7805700B2Sep 28, 2010
Physical-resist model using fast sweeping
LUMINESCENT TECHNOLOGIES INC34 citations92
US7703049B2Apr 20, 2010
System, masks, and methods for photomasks optimized with approximate and accurate merit functions
LUMINESCENT TECHNOLOGIES INC43 citations92
US7793253B2Sep 7, 2010
Mask-patterns including intentional breaks
LUMINESCENT TECHNOLOGIES INC6 citations62