Inventor

LEI JUNJIANG

US27 patents

⚠️ This page may combine multiple inventors who share the name “LEI JUNJIANG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

LEI JUNJIANG

TAIWAN SEMICONDUCTOR MFG CO LTD

Synchronized parallel tile computation for large area lithography simulation

Sub-resolution assist features

Lithographic mask correction using volume correction techniques

Synchronized parallel tile computation for large area lithography simulation

Synchronized parallel tile computation for large area lithography simulation

Sub-resolution assist features

Sub-resolution assist features

Machine learning based model builder and its applications for pattern transferring in semiconductor manufacturing

Machine learning based model builder and its applications for pattern transferring in semiconductor manufacturing

Lithographic mask correction using volume correction techniques

Synchronized parallel tile computation for large area lithography simulation

CADENCE DESIGN SYSTEMS INC

Method and system for model-based design and layout of an integrated circuit

Pattern signature

Intelligent pattern signature based on lithography effects

Method and system for implementing optimized lithography models for accuracy and resolution

Interpolation of irregular data in a finite-dimensional metric space in lithographic simulation

MENTOR GRAPHICS CORP

Optical proximity correction for directed-self-assembly guiding patterns

Neighbor-aware edge fragment adjustment for optical proximity correction

Optical proximity correction based on edge fragment correlation

Guiding patterns optimization for directed self-assembly

LAI YA-CHIEH

Method and system for performing pattern classification of patterns in integrated circuit designs

Method and system for model-based design and layout of an integrated circuit

Method and system for model-based design and layout of an integrated circuit

LEI JUNJIANG

Pattern signature

Edge fragment correlation determination for optical proximity correction

Intelligent pattern signature based on lithography effects

SIEMENS IND SOFTWARE INC

Optical proximity correction based on combining inverse lithography technology with pattern classification