P

Inventor

KITAGAWA HIROTAKA

JP24 patents
⚠️ This page may combine multiple inventors who share the name “KITAGAWA HIROTAKA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

FUJIFILM CORP

22 patents
US9263289B2Feb 16, 2016

Adhesion-promoting composition used between curable composition for imprints and substrate, and semiconductor device using the same

FUJIFILM CORP19 citations91
US8905534B2Dec 9, 2014

Ink composition and image forming method

FUJIFILM CORP8 citations83
US9376581B2Jun 28, 2016

Photo-curable composition for imprints, pattern forming method and pattern

FUJIFILM CORP3 citations73
US10246605B2Apr 2, 2019

Resin composition for underlayer film formation, layered product, method for forming pattern, imprint forming kit, and process for producing device

FUJIFILM CORP4 citations72
US9507263B2Nov 29, 2016

Underlay film composition for imprints and method of forming pattern and pattern formation method using the same

FUJIFILM CORP5 citations72
US9796803B2Oct 24, 2017

Under layer film-forming composition for imprints and method of forming pattern

FUJIFILM CORP4 citations71
US8802896B2Aug 12, 2014

Polyether compound, curing agent using the polyether compound, and producing method of the polyether compound

FUJIFILM CORP4 citations71
US11760932B2Sep 19, 2023

Liquid crystal polymer film and laminate

FUJIFILM CORP1 citations62
US10504739B2Dec 10, 2019

Curable composition for optical imprinting and pattern forming method

FUJIFILM CORP1 citations62
US10261413B2Apr 16, 2019

Photocurable composition for imprints, pattern forming method, and method for manufacturing device

FUJIFILM CORP1 citations62
US7943110B2May 17, 2011

Crosslinked carbon nanotube

FUJIFILM CORP2 citations62
US10191375B2Jan 29, 2019

Resin composition for underlayer film formation, layered product, method for forming pattern, imprint forming kit and process for producing device

FUJIFILM CORP1 citations61
US9868846B2Jan 16, 2018

Curable composition for imprints, patterning method and pattern

FUJIFILM CORP1 citations52
US10344177B2Jul 9, 2019

Under layer film-forming composition for imprints and method for forming pattern

FUJIFILM CORP0 citations51
US10189928B2Jan 29, 2019

Curable composition, pattern forming method, pattern, and method for manufacturing device

FUJIFILM CORP0 citations51
US9862847B2Jan 9, 2018

Inkjet discharge method, pattern formation method, and pattern

FUJIFILM CORP1 citations51
US8901351B2Dec 2, 2014

Precursor of polymerizable compound

FUJIFILM CORP0 citations51
US10739678B2Aug 11, 2020

Photocurable composition, pattern forming method, and method for manufacturing device

FUJIFILM CORP0 citations41
US10175576B2Jan 8, 2019

Curable composition for photo imprints, method for forming pattern, fine pattern, and method for manufacturing semiconductor device

FUJIFILM CORP0 citations41
US7393568B2Jul 1, 2008

Liquid crystal composition and liquid crystal element employing the composition

FUJIFILM CORP0 citations41
US7220465B2May 22, 2007

Liquid crystal composition, anthraquinone compound and liquid crystal device employing the composition

FUJIFILM CORP0 citations41
US10626287B2Apr 21, 2020

Resin composition for underlayer film formation, layered product, method for forming pattern, and process for producing device

FUJIFILM CORP0 citations40

AMAO Akihito

1 patent

YASUDA KOJI

1 patent