Inventor
SAITO SHUICHI
JP50 patents
⚠️ This page may combine multiple inventors who share the name “SAITO SHUICHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
NEC CORP
11 patentsUS5561072AOct 1, 1996
Method for producing shallow junction in surface region of semiconductor substrate using implantation of plasma ions
NEC CORP131 citations98
US6372591B1Apr 16, 2002
Fabrication method of semiconductor device using ion implantation
NEC CORP67 citations96
US6928297B2Aug 9, 2005
Portable telephone, diffuser and lighting device provided therein
NEC CORP22 citations92
US5837597ANov 17, 1998
Method of manufacturing semiconductor device with shallow impurity layers
NEC CORP27 citations92
US5759899AJun 2, 1998
Method of fabricating semiconductor device having a salicide structure
NEC CORP28 citations92
US6670639B1Dec 30, 2003
Copper interconnection
NEC CORP18 citations91
US6121137ASep 19, 2000
Method of fabricating semiconductor device
NEC CORP8 citations74
US5751954AMay 12, 1998
Router device and data communication system capable of suppressing traffic increase in communications among a plurality of lan segments
NEC CORP12 citations74
US6887001B2May 3, 2005
Key button structure for handheld mobile phone and its similar instrument, and method for forming the same
NEC CORP6 citations62
US10411979B2Sep 10, 2019
Control information management apparatus, control information presentation method, and program
NEC CORP0 citations52
US6444549B2Sep 3, 2002
Thermal processing of semiconductor devices
NEC CORP1 citations49
KYOCERA CORP
8 patentsUS12322576B2Jun 3, 2025
Member for use in plasma processing device, and plasma processing device provided therewith
KYOCERA CORP0 citations62
US12283466B2Apr 22, 2025
Member for use in plasma processing device, and plasma processing device provided therewith
KYOCERA CORP0 citations62
US12203161B2Jan 21, 2025
Component for plasma processing apparatus and plasma processing apparatus including component
KYOCERA CORP0 citations62
US12065727B2Aug 20, 2024
Member for plasma processing device and plasma processing device provided with same
KYOCERA CORP0 citations62
US11948779B2Apr 2, 2024
Component for plasma processing apparatus and plasma processing apparatus
KYOCERA CORP0 citations62
US11715629B2Aug 1, 2023
Plasma processing device member, plasma processing device comprising said plasma processing device member, and method for manufacturing plasma processing device member
KYOCERA CORP0 citations62
US11521835B2Dec 6, 2022
Plasma processing device member and plasma processing device provided with same
KYOCERA CORP0 citations62
US11111573B2Sep 7, 2021
Component and semiconductor manufacturing device
KYOCERA CORP0 citations62
TEAC CORP
6 patentsUS4975832ADec 4, 1990
Microcomputer system with dual DMA mode transmissions
TEAC CORP25 citations86
US5436774AJul 25, 1995
Dust-immune reading method and apparatus for magnetic tape transports
TEAC CORP7 citations73
US5416642AMay 16, 1995
Dust-immune method and apparatus for gain control of a read amplifier in a magnetic tape transport
TEAC CORP11 citations73
US5287229AFeb 15, 1994
Method of avoiding accidental overwriting on magnetic tape
TEAC CORP9 citations73
US5319503AJun 7, 1994
Method and apparatus for writing successive streams of data on a magnetic medium by writing a cancel mark indicating the cancellation of a previously-written file mark
TEAC CORP5 citations63
US6799230B2Sep 28, 2004
Peripheral device exchanging data with one of higher-order devices by switching interfaces
TEAC CORP3 citations59
MINOLTA CAMERA KK
4 patentsUS4695155ASep 22, 1987
Reader-printer having an image rotation device
MINOLTA CAMERA KK11 citations72
US4857965AAug 15, 1989
Reader-printer having an image rotation device
MINOLTA CAMERA KK4 citations61
US4857966AAug 15, 1989
Reader-printer having an image rotation device
MINOLTA CAMERA KK5 citations61
US5357295AOct 18, 1994
Image projecting apparatus provided with cartridge loader
MINOLTA CAMERA KK1 citations51
TOSHIBA KK
3 patentsUS6078365AJun 20, 2000
Active matrix liquid crystal panel having an active layer and an intervening layer formed of a common semiconductor film
TOSHIBA KK64 citations96
US12384959B2Aug 12, 2025
Tungsten oxide material, tungsten oxide powder mass for electrochromic device, and slurry for producing electrochromic device
TOSHIBA KK1 citations63
US11600866B2Mar 7, 2023
Semiconductor solid state battery
TOSHIBA KK0 citations61