Inventor

MAEHARA HIROSHI

JP44 patents

⚠️ This page may combine multiple inventors who share the name “MAEHARA HIROSHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

MAEHARA HIROSHI

CANON KK

X-ray mask, and exposure method and apparatus using the same

X-ray mask structure, process for production thereof, apparatus and method for X-ray exposure with the X-ray mask structure, and semiconductor device produced by the X-ray exposure method

Charged-particle beam exposure apparatus and device manufacturing method

Exposure apparatus

Optical element

Optical element

Mask manufacturing method and apparatus and device manufacturing method using a mask manufactured by the method or apparatus

Decomposable resin composition and method for producing the same

X-ray mask, and exposure method and apparatus using the same

Photosensitive resin, resist composition using the photosensitive resin, pattern formation method using the resist composition, device produced by the pattern formation method, and exposure method

Mask structure exposure method

Photosensitive resin, resist based on the photosensitive resin, exposure apparatus and exposure method using the resist, and semiconductor device obtained by the exposure method

X-ray mask and X-ray exposure method using the same

Diffractive optical element and optical instrument having the same

Reflection type mask structure and exposure apparatus using the same

Mask, method of producing a device using the mask and aligner with the mask

X-ray mask, and exposure apparatus and device production using the mask

Production method of an x-ray mask structure, an x-ray mask structure produced thereby, and a device fabricated by using the x-ray mask structure

Reflection type mask

Electron optical system array, method of manufacturing the same, charged-particle beam exposure apparatus, and device manufacturing method

Optical system and optical instrument with diffractive optical element

Illuminator, exposure apparatus, and method for fabricating device using the same

Decomposable resin composition and method for producing the same

Method for manufacture of optical element

Optical element

Resist solution for photolithography including a base resin and an oxygen-free or low-oxygen solvent

Membrane and mask, and exposure apparatus using the mask, and device producing method using the mask

X-ray mask and fabrication process using it

Lithographic mask structure and method of producing the same comprising W and molybdenum alloy absorber

X-ray mask structure and a production method thereof, an exposure method using the X-ray mask structure, and a device fabricated by using the X-ray mask structure

X-ray mask and semiconductor device manufacturing method using the same

Apparatus for handling minute object

Photosensitive resin composition, resist composition, fabrication method for patterned substrate, and device

Resin composition, method of molding the same, and method of recycling resin composition

Photosensitive resin composition, resist composition, fabricating method for patterned substrate, and device

Method of manufacturing semiconductor devices by performing coating, heating, exposing and developing in a low-oxygen or oxygen free controlled environment

Mask structure and method of making the same

Recyclable polymer and process for production thereof

Resin composition with biodegradable non-liquid-crystalline and liquid-crystalline polymers

Recyclable polymer, process for production thereof, and recycling treatment thereof

CHISSO CORP

Silicon-containing step ladder polymer and a process for producing the same

Silicon-containing step ladder polymer and a process for producing the same

MAEHARA HIROSHI

Lamp unit and projector employing same

HITACHI CONSUMER ELECTRONICS

Lamp unit and projector employing same