Inventor
KOH YOUNG-BUM
KR11 patents
Patents
11 patentsUS5851727ADec 22, 1998
Photosensitive polymers and photoresist compositions containing the same
SAMSUNG ELECTRONICS CO LTD35 citations92
US5789360AAug 4, 1998
Cleaning solution for use on a semiconductor wafer following chemical-mechanical polishing of the wafer and method for using same
SAMSUNG ELECTRONICS CO LTD41 citations92
US6092539AJul 25, 2000
In-situ cleaning apparatuses for wafers used in integrated circuit devices and methods of cleaning using the same
SAMSUNG ELECTRONICS CO LTD21 citations91
US6103845AAug 15, 2000
Chemically amplified resist polymers
SAMSUNG ELECTRONICS CO LTD11 citations81
US6280903B1Aug 28, 2001
Chemically amplified resist composition
SAMSUNG ELECTRONICS CO LTD5 citations73
US6171754B1Jan 9, 2001
Chemically amplified resist compositions
SAMSUNG ELECTRONICS CO LTD5 citations73
US6114084ASep 5, 2000
Chemically amplified resist composition
SAMSUNG ELECTRONICS CO LTD6 citations73
US6277204B1Aug 21, 2001
Methods for cleaning wafers used in integrated circuit devices
SAMSUNG ELECTRONICS CO LTD14 citations72
US6043206AMar 28, 2000
Solutions for cleaning integrated circuit substrates
SAMSUNG ELECTRONICS CO LTD13 citations72
US6713229B2Mar 30, 2004
Terpolymer for amplified resist
SAMSUNG ELECTRONICS CO LTD1 citations62
US6416927B1Jul 9, 2002
Chemically amplified resist compositions
SAMSUNG ELECTRONICS CO LTD1 citations62